Simple filtered repetitively pulsed vacuum arc plasma source

Chekh, Yu.; Zhirkov, Igor; Delplancke‐Ogletree, Marie‐Paule

doi:10.1063/1.3310096

Cited by 6 publications

(1 citation statement)

References 9 publications

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“…There, the particles are allowed to fly through the filter coil (see Figure 30). Such filtered sources have been miniaturized (44,45). Such filtered sources have been miniaturized (44,45).…”

Section: Different Filter Designsmentioning

confidence: 99%

Cathodic-Arc and Thermal-Evaporation Deposition

Koskinen

2014

Comprehensive Materials Processing

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Section: Different Filter Designsmentioning

confidence: 99%

Cathodic-Arc and Thermal-Evaporation Deposition

Koskinen

2014

Comprehensive Materials Processing

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Multiply charged metal ions in high current pulsed vacuum arcs

et al. 2017

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We show that vacuum arc plasma discharges with a current of several kiloamperes and duration of a few microseconds can generate multiply charged metal ions with charge states greater than 10+. The physical mechanism behind this is discussed, suggesting an optimum arc current for higher charge states depending on the pulse duration and cathode material. Measurements of ion mass-to-charge ratio and images taken with nanosecond resolution suggest that, higher charge state ions are produced at characteristic distances of ∼10 mm from the cathode as the arc current peaks, and the process responsible for their generation is additional ionization as the discharge is pinched by its self-magnetic field. The maximum and mean ion charge states reveal a considerable increase for the all cathode materials studied: magnesium, aluminum, zirconium, tin, tantalum, gold, lead, and bismuth. For bismuth ions, the maximum charge state reaches a record-breaking value of 17+ and the mean of the charge state distribution is 12.6+. The results obtained are of interest for vacuum arc discharge physics and for ion beam technologies.

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Plasma under control: Advanced solutions and perspectives for plasma flux management in material treatment and nanosynthesis

Baranov

Bazaka

Kersten

et al. 2017

Applied Physics Reviews

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Given the vast number of strategies used to control the behavior of laboratory and industrially relevant plasmas for material processing and other state-of-the-art applications, a potential user may find themselves overwhelmed with the diversity of physical configurations used to generate and control plasmas. Apparently, a need for clearly defined, physics-based classification of the presently available spectrum of plasma technologies is pressing, and the critically summary of the individual advantages, unique benefits, and challenges against key application criteria is a vital prerequisite for the further progress. To facilitate selection of the technological solutions that provide the best match to the needs of the end user, this work systematically explores plasma setups, focusing on the most significant family of the processes—control of plasma fluxes—which determine the distribution and delivery of mass and energy to the surfaces of materials being processed and synthesized. A novel classification based on the incorporation of substrates into plasma-generating circuitry is also proposed and illustrated by its application to a wide variety of plasma reactors, where the effect of substrate incorporation on the plasma fluxes is emphasized. With the key process and material parameters, such as growth and modification rates, phase transitions, crystallinity, density of lattice defects, and others being linked to plasma and energy fluxes, this review offers direction to physicists, engineers, and materials scientists engaged in the design and development of instrumentation for plasma processing and diagnostics, where the selection of the correct tools is critical for the advancement of emerging and high-performance applications.

show abstract

Simple filtered repetitively pulsed vacuum arc plasma source

Cited by 6 publications

References 9 publications

Cathodic-Arc and Thermal-Evaporation Deposition

Cathodic-Arc and Thermal-Evaporation Deposition

Multiply charged metal ions in high current pulsed vacuum arcs

Plasma under control: Advanced solutions and perspectives for plasma flux management in material treatment and nanosynthesis

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