Similarity of Plasma-Polymerized Tetrafluoroethylene and Fluoropolymer Films Deposited by rf Sputtering of Poly(tetrafluoroethylene)

Golub, Morton A.; Wydeven, T.; Johnson, Allen L.

doi:10.1021/la971102e

Cited by 37 publications

(37 citation statements)

References 24 publications

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“…Oxygen peaks that would indicate contamination and/or altered chemistry, do not appear in the full XPS scans, in contrast to other reports on vapor-phase deposition of PTFE. 9,3 The relatively high degree of crystallinity shown in the XPS scans is consistent with the absence of absorption bands corresponding to amorphous PTFE inclusions.…”

Section: Resultssupporting

confidence: 61%

Infrared laser deposition of Teflon coatings on microstructures

Papantonakis

Haglund

2006

SPIE Proceedings

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Polytetrafluoroethylene (PTFE, trade name Teflon®) has a wide range of unique and desirable physical, electrical and chemical properties. Its tribological properties are well-suited to anti-stiction applications, and its chemical inertness commends it as a barrier and passivation layer. However, conventional thin-film techniques are not suited for depositing Teflon® films on microstructures. Spin coating is impossible because of the well-known insolubility of PTFE. Plasma polymerization of fluorocarbon monomers, ion beam and rf sputtering produce PTFE films that are deficient in fluorine. Pulsed laser deposition (PLD) using excimer and Ti:sapphire lasers is unsatisfactory because UV or near-IR laser ablation "unzips" the PTFE, and requires high-temperature annealing to re-polymerize the deposited monomeric film. We have demonstrated that a completely dry, vapor-phase coating technique -resonant infrared pulsed laser deposition (RIR-PLD) at a wavelength of 8.26 µm -produces crystalline, smooth Teflon® films at low process temperatures. Indeed, the films as deposited by RIR-PLD exhibit a surprising degree of crystallinity even at room temperature. The stoichiometry and local electronic structure are preserved during the laser vaporization process, as demonstrated by IR absorption and X-ray photoelectron spectroscopy. Films deposited on microscale structures show good adhesion, excellent smoothness, and a high degree of conformability to the structures. We also discuss experiments planned for the near future to compare the tribological properties of the PTFE films deposited by RIR-PLD with those of other tribological coatings. We will also discuss the implementation of RIR-PLD in practical processing schemes for MEMS applications, including the challenge in adapting existing solid-state mid-IR laser technology for this purpose.

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Section: Resultssupporting

confidence: 61%

Infrared laser deposition of Teflon coatings on microstructures

Papantonakis

Haglund

2006

SPIE Proceedings

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“…3 The absorption bands in the FTIR spectra of the s-PTFE film are similar to those of the films obtained under different sputtering configurations. 12,14,15 An extra absorption at 1720 cm 1 (-CF CF-stretch) was also observed in the referenced studies. 12,14,15 The pp-HDFD film deposited at an r.f.…”

Section: Fourier Transform Infrared Spectroscopysupporting

confidence: 55%

“…12,14,15 An extra absorption at 1720 cm 1 (-CF CF-stretch) was also observed in the referenced studies. 12,14,15 The pp-HDFD film deposited at an r.f. power of 5 W shows the characteristic absorption bands of the CF 2 groups at wavenumbers of 640 cm 1 (CF 2 rocking), 1152 cm 1 (asymmetric C-F stretch) and 1208 cm 1 (symmetric C-F stretch).…”

Section: Fourier Transform Infrared Spectroscopysupporting

confidence: 55%

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Characterization of fluoropolymer films deposited by magnetron sputtering of poly(tetrafluoroethylene) and plasma polymerization of heptadecafluoro‐1‐decene (HDFD) on (100)‐oriented single‐crystal silicon substrates

Zhang

Yang

Kang

et al. 2002

Surface & Interface Analysis

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Fluoropolymer thin films have been deposited on (100)-oriented single-crystal silicon substrates via argon plasma sputtering of a poly(tetrafluoroethylene) (PTFE) target and plasma polymerization of 1H,1H,2H-heptadecafluoro-1-decene (HDFD). The surface composition and molecular structure of the deposited fluoropolymer films were analysed by x-ray photoelectron spectroscopy (XPS), time-of-flight secondary ion mass spectrometry (ToF-SIMS) and Fourier transform infrared (FTIR) spectroscopy. The ToF-SIMS spectrum of the sputter-deposited PTFE (s-PTFE) surface revealed a high concentration of oligomeric -(CF 2 )-segments, resembling that of the pristine PTFE surface. However, the ToF-SIMS spectra of the plasma-polymerized HDFD (pp-HDFD) films showed the presence of oligomeric -(CF 2 )-segments with much shorter repeat units, in comparison with those of the pristine PTFE and s-PTFE film. The XPS and FTIR results suggested that the surface composition and chemical structure of the pp-HDFD film deposited at a high r.f. power were closer to those of the s-PTFE film. Water contact angle and atomic force microscopy measurements indicated that both sputtering deposition and plasma polymerization could give rise to highly hydrophobic surfaces with good uniformity. Peel adhesion test results suggested that both the s-PTFE and pp-HDFD films were strongly tethered to the surface of Si substrates.

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“…After being firstly reported in the 1970s, the plasma sputter‐deposited fluoropolymers have been shown to be useful as dielectric films, water‐repellent coatings, low friction coatings, and even optical coatings 15–17. The effects of various experimental parameters, such as sputtering gas, voltage, radio frequency (RF) input power, magnetic field, target/substrate distance, pressure, and gas composition on the properties of the deposited polymeric films have been investigated 18–24…”

Section: Introductionmentioning

confidence: 99%

Ultrathin Fluoropolymer Films Deposited on a Polyimide (Kapton®) Surface by RF Magnetron Sputtering of Poly(tetrafluoroethylene)

Wang

2007

Plasma Processes & Polymers

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PI surfaces were modified by RF plasma sputtering of a PTFE target. Ultrathin fluoropolymer films of 10–50 nm thickness were deposited. The sputter‐deposited polymeric films were characterized by XPS, ToF‐SIMS and FT‐IR spectroscopy. The results indicated that the chemical composition and molecular structure of the films depended strongly on the type of the sputtering gas used. Water contact angle measurements showed that the sputter‐deposited PTFE film could effectively passivate the PI surface. The topography of the modified PI surface was investigated by AFM. The 180°‐peel adhesion test results suggested that all the sputter‐deposited films adhered strongly to the PI substrates.

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Similarity of Plasma-Polymerized Tetrafluoroethylene and Fluoropolymer Films Deposited by rf Sputtering of Poly(tetrafluoroethylene)

Cited by 37 publications

References 24 publications

Infrared laser deposition of Teflon coatings on microstructures

Infrared laser deposition of Teflon coatings on microstructures

Characterization of fluoropolymer films deposited by magnetron sputtering of poly(tetrafluoroethylene) and plasma polymerization of heptadecafluoro‐1‐decene (HDFD) on (100)‐oriented single‐crystal silicon substrates

Ultrathin Fluoropolymer Films Deposited on a Polyimide (Kapton®) Surface by RF Magnetron Sputtering of Poly(tetrafluoroethylene)

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