Silver thin films deposited by magnetron sputtering

Maréchal, N.; Quesnel, Etienne; Pauleau, Y.

doi:10.1016/0040-6090(94)90391-3

Cited by 69 publications

(48 citation statements)

References 15 publications

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“…Of these, the most widely studied has been the effect of gas pressure. For sputtered aluminum films, an exhaustive literature search revealed only a few studies that examine the intrinsic stress properties of sputter deposited aluminum films that were less than 1 m in thickness [Ple09, Kim98, Hof77] and even fewer were found for gold [Keb90] and silver [Mar94]. These studies provided the starting parameters for deposition conditions; however, the variations in machines made the direct translation of process parameters difficult.…”

Section: Internal Stressesmentioning

confidence: 99%

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A Microcantilever Platform for Measuring Internal Friction in Thin Films Using Thermoelastic Damping for Calibration

Sosale

Prabhakar

Fréchette

et al. 2011

J. Microelectromech. Syst.

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Measuring structural damping due to internal friction in deposited thin films can provide useful guidelines for the design of high-Q micro/nanomechanical resonators utilized used for sensing, communications and vibration energy harvesting. Such measurements can also generate valuable insights into the effects of size and confinement on the mechanisms of damping in these films. Typically, these measurements are carried out by depositing a thin film on a relatively thick cantilevered substrate and measuring the change in damping in the substrate/film composite. However, the measured damping is due to losses from several sources including support losses, clamping losses, thermoelastic damping (TED) and internal friction losses in the substrate/film composite. Accurately identifying the magnitude of internal friction in the film has been a long-standing difficulty in this field. This thesis presents the design and development of a silicon microcantilever platform to resolve this difficulty. At the core of the platform is the ability to reduce the damping in single crystal silicon microcantilevers to low levels of damping approaching the fundamental limits of dissipation established by thermoelastic damping (TED). This demonstrates that all other sources of damping (viscous losses, support losses and internal friction losses) are sufficiently low. These cantilevers can then be coated with the thin film of interest and the damping in the substrate/film composite measured. The measured damping is comprised of the thermoelastic damping in the substrate/film composite and the internal friction in the film. The former can be calculated using accurate models and the initial damping can be substracted from the measured damping in the composite to obtain an accurate estimate of the internal friction in the film. ) with values approaching the TED limit. Subsets of these beams are then used to carry out the first calibrated iii measurements on the effects of thickness and frequency on internal friction in thin films of aluminum, gold and silver at room temperature. The films ranged in thickness from 60 nm to 450 nm and were studied over frequencies from 100 Hz to 1.5 kHz. The results of this study provide two valuable guidelines for the design of low dissipation (high Q) layered composite resonators: gold leads to a smaller increase in damping than either aluminum or silver, and damping in the composite resonators can be decreased by reducing the film thickness. As a third design guideline, a strategy to control and minimize the damping by selective patterning of thin films on the resonator is described. In this work, a simple model is developed to predict the damping in partially metalized cantilevered beams and experimentally validated using the platform. The silicon microcantilever platform, and the results obtained using this platform establish a foundation for studying internal friction in thin films.iv vi

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Section: Internal Stressesmentioning

confidence: 99%

“…For two dimensional stresses such as those on a wafer, an additional correction is to use the biaxial modulus to yield Keb90,Mar94] were used for sputtering. The films were deposited using DC sputtering without actively heating or cooling the substrates, and using metal targets with purity greater than 99.95 %.…”

Section: Measuring Film Stressmentioning

confidence: 99%

A Microcantilever Platform for Measuring Internal Friction in Thin Films Using Thermoelastic Damping for Calibration

Sosale

Prabhakar

Fréchette

et al. 2011

J. Microelectromech. Syst.

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“…ПОСТАНОВКА ЗАДАЧИ Электрические свойства медных и серебряных пленок значительно зависят от таких технологических пара-метров их производства, как температура [1], материал подложки [8], давление в камере [9], тип распыления (высокочастотное распыление [10,11] или распыление с магнетрона постоянного тока [12]) и мощность [13], скорость осаждения [7], конфигурация электромагнитного поля и площадь мишени [14].…”

Section: Doi: 1025206/2310-9793-2017-5-2-204-208unclassified

“…2) пленки субмикронной толщины (от 50 до 800 нм [10]), механизм проводимости которых определяется преимущественно объемной составляющей.…”

Section: Doi: 1025206/2310-9793-2017-5-2-204-208unclassified

The effect of microstructure and surface roughness on the electrical conductivity of thin copper and silver films obtained by the method of magnetron sputtering

Polonyankin

Блесман

Postnikov

2017

DSMM

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“…In a magnetron, Ag atoms and ions strike the surface with an energy of a few eV at rate between 3 and 50 mL/s dependent on a range of parameters such as power, current and argon pressure. 19 As a simplified model of this process, each incoming Ag particle was assumed to be charge neutral and to strike the surface with an energy of 3 eV. Thus a randomly positioned Ag atom is given an energy level of 3 eV and directed normally toward the surface.…”

Section: A Akmcmentioning

confidence: 99%

Growth of silver on zinc oxide via lattice and off-lattice adaptive kinetic Monte Carlo

2018

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The growth of Ag on ZnO was modeled using a reactive force field potential and a combination of molecular dynamics and adaptive kinetic Monte Carlo (AKMC) simulations. An adaptive lattice-based AKMC model is described as a method of extending timescales and length scales that can be simulated. Reusing previously found transitions to reduce computational time is discussed for both the lattice and off-lattice AKMC approaches. With these methods, growth of over 1 monolayer's worth of Ag is simulated corresponding to a real deposition time of up to 0.1 s. The results show that the deposited silver aggregates on the surface through mainly single atom moves with few concerted motions. Initially silver adatoms do not agglomerate and the energy barriers for silver dimers to form are larger than for them to break apart. The first layer of silver grows as a series of connected regions rather than forming well-defined centro-symmetric islands.

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Silver thin films deposited by magnetron sputtering

Cited by 69 publications

References 15 publications

A Microcantilever Platform for Measuring Internal Friction in Thin Films Using Thermoelastic Damping for Calibration

A Microcantilever Platform for Measuring Internal Friction in Thin Films Using Thermoelastic Damping for Calibration

The effect of microstructure and surface roughness on the electrical conductivity of thin copper and silver films obtained by the method of magnetron sputtering

Growth of silver on zinc oxide via lattice and off-lattice adaptive kinetic Monte Carlo

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