Siloxane Copolymers for Nanoimprint Lithography

Choi, Philip Y.; Fu, Peng; Guo, L. Jay

doi:10.1002/adfm.200600257

Cited by 35 publications

(34 citation statements)

References 17 publications

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“…[71] Figure 8a shows a 250 nm linewidth grating imprinted in PDMS-b-PS. Figure 8b and c shows a 70 nm linewidth grating mold made in a silicon nitride layer and the PDMS-g-PMIA resist imprinted at 170°C and 1.3 MPa pressure for 30 s with this mold.…”

Section: Siloxane Copolymersmentioning

confidence: 99%

Nanoimprint Lithography: Methods and Material Requirements

2007

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Nanoimprint lithography (NIL) is a nonconventional lithographic technique for high‐throughput patterning of polymer nanostructures at great precision and at low costs. Unlike traditional lithographic approaches, which achieve pattern definition through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the resist material and can therefore achieve resolutions beyond the limitations set by light diffraction or beam scattering that are encountered in conventional techniques. This Review covers the basic principles of nanoimprinting, with an emphasis on the requirements on materials for the imprinting mold, surface properties, and resist materials for successful and reliable nanostructure replication.

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Section: Siloxane Copolymersmentioning

confidence: 99%

Nanoimprint Lithography: Methods and Material Requirements

2007

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“…In this context, we have recently investigated a number of PDMS-based polymer and copolymer systems to simultaneously address the sticking and dry etching issues. [29,30] In this Communication, we report a novel thermally curable PDMS-based nanoimprinting resist that allows successful replication of 70 nm line-width structures within a few seconds, a 20-fold reduction compared to previously reported PDMS-based materials and typical thermoplastic nanoimprint resists. Moreover, the crosslinked PDMS has sufficient mechanical strength and integrity to be used as a mold for nanoimprinting or as a stamp for many soft-lithography applications.…”

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confidence: 92%

“…5b), after the residual layer was removed by RIE, the PDMS structures present no apparent roughness from the plasma etching, in contrast to the results obtained previously with PDMS copolymers. [30] Finally, the patterned PDMS was used as an etch mask to transfer the pattern into a SiO 2 layer by RIE using the combined gases of CF 4 , Ar, and O 2 . As presented in Figure 5c and d, the SiO 2 pattern remained smooth.…”

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High‐Throughput and Etch‐Selective Nanoimprinting and Stamping Based on Fast‐ Thermal‐Curing Poly(dimethylsiloxane)s

et al. 2007

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Nanoimprint lithography (NIL) is a patterning technique that has emerged as one of the most promising technologies for high-throughput nanoscale replication. [1,2] Several applications in electronics, photonics, magnetic devices, and the biological field have been developed using this simple, low-cost, and high-resolution technique. In the biological field, DNA, [3] proteins, [4][5][6] and guides for molecular motors have been patterned; [7] nanowire arrays have been fabricated for electronic applications; [8] new magnetic devices, such as patterned magnetic media [9,10] and high density quantized magnetic discs, [11] have been engineered; and wire grid polarizers, [12,13] lightemitting diodes, [14,15] and diffractive optical elements [16] have been developed for photonics. The success of NIL as a next generation lithographic technique strongly depends on the research for new materials that are better suited as the nanoimprint resist. Because imprint lithography makes a conformal replica of surface relief patterns by mechanical embossing, the resist materials used in imprinting should be deformed easily under an applied pressure. The most commonly used materials in the original NIL scheme are thermal plastic polymers, which become viscous fluids when heated above their glass transition temperatures (T g ). However the viscosity of the heated polymers is typically high and thus the imprinting process requires significant pressure. In addition, these thermal plastic resists normally have a high tendency to stick to the mold because of non-optimized chemistry and orientation of the polymer backbone structures, which seriously affects the fidelity and quality of the pattern definition. Furthermore they do not offer the necessary etch resistance. Therefore, a nanoimprint resist system with combined mold-release and etch-resistance properties that allows fast and precise nanopatterning is highly desirable.Thermally curable monomers are very attractive materials for nanoimprint applications because they present in the liquid state, making it possible for them to be imprinted in a short period of time under low pressure and temperature, in sharp contrast to thermal plastic polymers. As one of these materials, poly(dimethylsiloxane) (PDMS) has previously been used by several research groups for micropatterning, mainly in the context of soft lithography, [17][18][19][20][21] and has found numerous applications in fields as diverse as microelectrochemical systems (MEMS), biotechnology, photonics, and nanoelectronics. In addition to its well known transparency to UV and visible light along with its good biocompatibility, it has a low surface energy (18-21 mN m -1 ) [22] that allows easy mold release without causing any structural damage to the imprinted structures; moreover, it posses a high resistance to oxygen plasma because of a higher silicon content. However, the PDMS material made from commercial Sylgard 184 as precursor is not suitable for nanoimprint applications because of two significant drawbacks. Firstly, its cur...

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“…The optical sensors as described before are often organic fluorescent dyes that can reversibly change their fluorescence emission depending on the presence of a specific analyte. This section is focused on the application of polyelectrolyte multilayer capsules as carrier system, since they are one of the most versatile platforms of micrometer-sized containers (Choi et al, 2007; De_Geest et al, 2009; Becker et al, 2010). Furthermore, they have been proved to be excellent carriers for different cargoes to different cells in vitro and in vivo as well as exhibiting enhanced biocompatibility (De_Koker et al, 2007; Hartig et al, 2007; Rivera_Gil et al, 2009; Kolbe et al, 2011).…”

Section: Ion Sensors At the Micro Scalementioning

confidence: 99%

Subcellular Carrier-Based Optical Ion-Selective Nanosensors

et al. 2012

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In this review, two carrier systems based on nanotechnology for real-time sensing of biologically relevant analytes (ions or other biological molecules) inside cells in a non-invasive way are discussed. One system is based on inorganic nanoparticles with an organic coating, whereas the second system is based on organic microcapsules. The sensor molecules presented within this work use an optical read-out. Due to the different physicochemical properties, both sensors show distinctive geometries that directly affect their internalization patterns. The nanoparticles carry the sensor molecule attached to their surfaces whereas the microcapsules encapsulate the sensor within their cavities. Their different size (nano and micro) enable each sensors to locate in different cellular regions. For example, the nanoparticles are mostly found in endolysosomal compartments but the microcapsules are rather found in phagolysosomal vesicles. Thus, allowing creating a tool of sensors that sense differently. Both sensor systems enable to measure ratiometrically however, only the microcapsules have the unique ability of multiplexing. At the end, an outlook on how more sophisticated sensors can be created by confining the nano-scaled sensors within the microcapsules will be given.

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Siloxane Copolymers for Nanoimprint Lithography

Cited by 35 publications

References 17 publications

Nanoimprint Lithography: Methods and Material Requirements

Nanoimprint Lithography: Methods and Material Requirements

High‐Throughput and Etch‐Selective Nanoimprinting and Stamping Based on Fast‐ Thermal‐Curing Poly(dimethylsiloxane)s

Subcellular Carrier-Based Optical Ion-Selective Nanosensors

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