1988
DOI: 10.1007/bf01141592
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Silicone polymer deposition by CO2 laser induced decomposition of silane in the presence of methyl methacrylate

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Cited by 2 publications
(6 citation statements)
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“…27 Solid-state MAS and CP MAS NMR experiments were conducted on a Bruker DSX200 NMR spectrometer in a 4-mm broadband probe. 13 C and 29 Si NMR spectra were externally referenced to the carbonyl line of glycine (δ ) 176.03) and to the M unit line of M8Q8 (δ ) 11.5), respectively. The samples were spun with spinning speed of 1600 Hz for 29 Si CP MAS experiments, 2500 Hz for 29 Si MAS experiments, and 4000 Hz for 13 C experiments.…”
Section: Methodsmentioning
confidence: 99%
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“…27 Solid-state MAS and CP MAS NMR experiments were conducted on a Bruker DSX200 NMR spectrometer in a 4-mm broadband probe. 13 C and 29 Si NMR spectra were externally referenced to the carbonyl line of glycine (δ ) 176.03) and to the M unit line of M8Q8 (δ ) 11.5), respectively. The samples were spun with spinning speed of 1600 Hz for 29 Si CP MAS experiments, 2500 Hz for 29 Si MAS experiments, and 4000 Hz for 13 C experiments.…”
Section: Methodsmentioning
confidence: 99%
“…13 C and 29 Si NMR spectra were externally referenced to the carbonyl line of glycine (δ ) 176.03) and to the M unit line of M8Q8 (δ ) 11.5), respectively. The samples were spun with spinning speed of 1600 Hz for 29 Si CP MAS experiments, 2500 Hz for 29 Si MAS experiments, and 4000 Hz for 13 C experiments. Relaxation delay of 60 s for all MAS experiments and 6 s for all CP MAS experiments were used.…”
Section: Methodsmentioning
confidence: 99%
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“…A solid polymer with poly(dimethylsiloxane) structure has been deposited by using a TEA C02 laser to irradiate a methylmethacrylate (MMA)/SiH4 mixture. 316 Collisionally assisted infrared laser multiple-photon dissociation of the silane produces SiH2 radicals that add to the carbon double bonds in MMA to form three-membered rings, which then decompose into a siloxane polymer. Also, 1-methyl-l-silacyclobutane has been decomposed by CW C02 laser heating of an SF6 sensitizer to form an organosilicon polymer.317…”
Section: Compound Insulatorsmentioning
confidence: 99%