Silicon Wafer Microstructure Fabrication Using Nanosecond Laser Pulses

Abstract

In this paper, we created some microstructures on the surface of silicon by irradiating a silicon wafer for soalr cell with trains of short pulses in the presence of an ambient gas.The laser pulse produced by TEA CO2 laser is high power and shorter than a microsecond in duration. We found that the morphology of the structures is highly dependent on the species of ambient gas and the number of laser pulses used. I note that surfaces covered with these microstructures have striking optical properties: structures absorb approximately 90% of incident light with wavelengths between 250 nm and 0.85μm.The remarkable and potentially useful optical properties of the structures should be beneficial in increasing the efficiency of crystalline silicon soalr cell.