Silicon suboxide (SiOx): laser processing and applications

Fricke-Begemann, Thomas; Meinertz, J.; Weichenhain-Schriever, R.; Ihlemann, J.

doi:10.1007/s00339-014-8236-3

Cited by 9 publications

(8 citation statements)

References 22 publications

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“…Thereafter, silica rich vapours formed and condensed, promoting silica to emerge as the phase that dominated particle nucleation during UPG processing. Furthermore, oxides lose oxygen at high melting temperatures, consequently they become reduced and may decompose partially, which is also the case for silica where the suboxide (SiOx) forms upon melting and reacts in air to form nanosized SiO2 (Fricke-Begemann, Meinertz, Weichenhain-Schriever, & Ihlemann, 2014;Saxena, Agarwal, & Kanjilal, 2011;Slaoui, Fogarassy, Fuchs, & Siffert, 1992;Zhang, Lifshitz, & Lee, 2003). Two types of alumina particles can be seen in Fig.…”

Section: Experiments Carried Out Under High Energy Settingsmentioning

confidence: 94%

Nanoparticle formation and emission during laser ablation of ceramic tiles

Salmatonidis

Viana

Pérez

et al. 2018

Journal of Aerosol Science

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Pulsed laser ablation (PLA) is a widely used technology, for surface structuring and tile decoration in the ceramic industry. During PLA, nanoparticles (NP <100 nm) are unintentionally released and may impact exposure. This work aims to understand the mechanisms controlling NP formation and release during ablation of different types of ceramic tiles, using different laser setups (near-IR and mid-IR). The measurements took place at laboratory and pilot-plant-scale, with varying laser wavelength, frequency, velocity, and pulse duration. In total, the combination of 4 types of ceramic tiles and 2 lasers was assessed. Particle number concentration and size distribution (SMPS with nano-DMA, DiSCmini, butanol-CPC) and particle mass concentration (DustTrak-DRX) were monitored. Samples were also collected for morphological and chemical characterization (TEM/EDX). High particle number concentrations were detected (3.5*10 4 /cm 3 to 2.5*10 6 /cm 3) for all of the tiles and under both laser setups. Particle formation (<10 nm) by nucleation was detected, and secondary amorphous SiO2 nanoparticles (>10 nm) were formed and released during ablation of the porcelain tiles. Different release mechanisms were identified: during ablation with the near-IR laser particles were emitted through melting and nucleation, while emissions from the mid-IR laser were attributed to melting and mechanical shockwaves. Particle number and mass emissions were dependent on the tile surface characteristics (e.g., porosity, crystallinity) and chemical properties. This work is potentially relevant from the point of view of exposure mitigation strategies in industrial facilities where PLA is carried out.

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Section: Experiments Carried Out Under High Energy Settingsmentioning

confidence: 94%

Nanoparticle formation and emission during laser ablation of ceramic tiles

Salmatonidis

Viana

Pérez

et al. 2018

Journal of Aerosol Science

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“…Current limitations include slow processing times and short working distances between the target and the focusing lens [14]. Silicon suboxide is a substoichiometric silicon oxide that has a larger refractive index and a larger optical absorption coefficient in the region from ultra-violet (UV) to near-infrared (NIR) than other glass materials such as fused silica, borosilicate, and soda-lime glass [15][16][17][18]. In addition, it can be easily oxidized to SiO2 by thermal treatment (~1000 °C ) in air to become transparent in the UV-NIR region [18].…”

Section: Methodsmentioning

confidence: 99%

“…As a target, we used a silicon suboxide, SiO x ( x ≈ 1) film of 1.4 μm thickness deposited on a fused silica substrate by thermal evaporation (Leybold UNIVEX 350, Cologne, Germany) [ 18 ]. Figure 1 a shows the refractive index n and the extinction coefficient κ measured as a function of wavelength λ = 300–900 nm with a spectroscopic ellipsometer (M-220, JASCO Corporation, Tokyo, Japan).…”

Section: Methodsmentioning

confidence: 99%

“…In addition, because the refractive index of silicon suboxide was measured as n = 1.8–2.4 in the UV–NIR region, which is much larger than that of glass such as fused silica as shown in Figure 1 a, β of the film applied in this work should also be larger. In a previous report, a silicon suboxide film 700 nm thick was confirmed to be able to oxidize to SiO 2 by annealing in air at ~1000 °C for 48 h, resulting in an increase of the transmittance in the UV–NIR region [ 18 ].…”

Section: Methodsmentioning

confidence: 99%

“…Silicon suboxide is a substoichiometric silicon oxide that has a larger refractive index and a larger optical absorption coefficient in the region from ultra-violet (UV) to near-infrared (NIR) than other glass materials such as fused silica, borosilicate, and soda-lime glass [ 15 , 16 , 17 , 18 ]. In addition, it can be easily oxidized to SiO 2 by thermal treatment (~1000 °C) in air to become transparent in the UV–NIR region [ 18 ]. Thermal treatment in an oxygen-free environment leads to the formation of silicon nanocrystals [ 19 ].…”

Section: Introductionmentioning

confidence: 99%

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Fabrication of Periodic Nanostructures on Silicon Suboxide Films with Plasmonic Near-Field Ablation Induced by Low-Fluence Femtosecond Laser Pulses

et al. 2020

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Silicon suboxide (SiOx, x ≈ 1) is a substoichiometric silicon oxide with a large refractive index and optical absorption coefficient that oxidizes to silica (SiO2) by annealing in air at ~1000 °C. We demonstrate that nanostructures with a groove period of 200–330 nm can be formed in air on a silicon suboxide film with 800 nm, 100 fs, and 10 Hz laser pulses at a fluence an order of magnitude lower than that needed for glass materials such as fused silica and borosilicate glass. Experimental results show that high-density electrons can be produced with low-fluence femtosecond laser pulses, and plasmonic near-fields are subsequently excited to create nanostructures on the surface because silicon suboxide has a larger optical absorption coefficient than glass. Calculations using a model target reproduce the observed groove periods well and explain the mechanism of the nanostructure formation.

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