Silicon Photonic Circuit Design Using Rapid Prototyping Foundry Process Design Kits

Chrostowski, Lukas; Shoman, Hossam; Hammood, Mustafa; Yun, Han; Jhoja, Jaspreet; Luan, Enxiao; Lin, Stephen; Mistry, Ajay; Witt, Donald; Jaeger, Nicolas A. F.; Shekhar, Sudip; Jayatilleka, Hasitha; Jean, Philippe; Villers, Simon Bélanger-de; Cauchon, Jonathan; Shi, Wei; Horvath, Cameron; Westwood‐Bachman, Jocelyn N.; Setzer, Kevin; Aktary, Mirwais; Patrick, N. Shane; Bojko, Richard; Khavasi, Amin; Wang, Xu; Lima, Thomas Ferreira de; Tait, Alexander N.; Prucnal, Paul R.; Hagan, David; Stevanovic, D. V.; Knights, A. P.

doi:10.1109/jstqe.2019.2917501

Cited by 73 publications

(34 citation statements)

References 60 publications

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“…Different types of manufacturing process are offered to meet the needs of fabless designers, based on different material platforms, technology nodes, volumes of chips, turnaround time, and cost. For proof-of-concepts, rapid prototyping services (ex: AMO, Applied Nano Tool, Cornerstone, CNM/VLC, LIGENTEC) offer fast turnarounds but low functionalities and low volumes of chips, in part because their fabrication process often relies on e-beam lithography [71] instead of photolithography (exceptions include Cornerstone that uses 248 nm photolithography). Silicon photonic manufacturing is advancing toward both standardization and diversification in terms of materials, layer thickness, and process.…”

Section: Ecosystem and Trendsmentioning

confidence: 99%

Scaling capacity of fiber-optic transmission systems via silicon photonics

2020

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The tremendous growth of data traffic has spurred a rapid evolution of optical communications for a higher data transmission capacity. Next-generation fiber-optic communication systems will require dramatically increased complexity that cannot be obtained using discrete components. In this context, silicon photonics is quickly maturing. Capable of manipulating electrons and photons on the same platform, this disruptive technology promises to cram more complexity on a single chip, leading to orders-of-magnitude reduction of integrated photonic systems in size, energy, and cost. This paper provides a system perspective and reviews recent progress in silicon photonics probing all dimensions of light to scale the capacity of fiber-optic networks toward terabits-per-second per optical interface and petabits-per-second per transmission link. Firstly, we overview fundamentals and the evolving trends of silicon photonic fabrication process. Then, we focus on recent progress in silicon coherent optical transceivers. Further scaling the system capacity requires multiplexing techniques in all the dimensions of light: wavelength, polarization, and space, for which we have seen impressive demonstrations of on-chip functionalities such as polarization diversity circuits and wavelength- and space-division multiplexers. Despite these advances, large-scale silicon photonic integrated circuits incorporating a variety of active and passive functionalities still face considerable challenges, many of which will eventually be addressed as the technology continues evolving with the entire ecosystem at a fast pace.

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Section: Ecosystem and Trendsmentioning

confidence: 99%

Scaling capacity of fiber-optic transmission systems via silicon photonics

2020

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“…Device fabrication and testing was carried out through the Silicon Electronic-Photonic Integrated Circuits program [62]. Structures were fabricated using standard 220 nm SOI via 100 keV electron beam lithography and reactive ion etching at the University of Washington, while automated grating coupled device measurements were performed at The University of British Columbia.…”

Section: Fabricationmentioning

confidence: 99%

Robust optical physical unclonable function using disordered photonic integrated circuits

et al. 2020

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AbstractPhysical unclonable function (PUF) has emerged as a promising and important security primitive for use in modern systems and devices, due to their increasingly embedded, distributed, unsupervised, and physically exposed nature. However, optical PUFs based on speckle patterns, chaos, or ‘strong’ disorder are so far notoriously sensitive to probing and/or environmental variations. Here we report an optical PUF designed for robustness against fluctuations in optical angular/spatial alignment, polarization, and temperature. This is achieved using an integrated quasicrystal interferometer (QCI) which sensitively probes disorder while: (1) ensuring all modes are engineered to exhibit approximately the same confinement factor in the predominant thermo-optic medium (e. g. silicon), and (2) constraining the transverse spatial-mode and polarization degrees of freedom. This demonstration unveils a new means for amplifying and harnessing the effects of ‘weak’ disorder in photonics and is an important and enabling step toward new generations of optics-enabled hardware and information security devices.

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“…The devices were fabricated on SOI wafers by electronbeam lithography at Applied NanoTools [21]. The BOX layer was 2.0 microns and the silicon device layer was 220 nm.…”

Section: B Device Fabrication and Testmentioning

confidence: 99%

Slow Light in Subwavelength Grating Waveguides

Jean

Gervais

LaRochelle

et al. 2020

IEEE J. Select. Topics Quantum Electron.

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Structural slow light is the dispersion engineering process by which the group velocity of light can be drastically reduced in a periodic waveguide structure. Enabling large group delay and enhancing the light-matter interaction on a subwavelength scale, on-chip slow light is of great interest in a vast array of fields such as non-linear optic, sensing, laser physics, telecommunication and computing. In this work, we experimentally demonstrate, for the first time, slow light in subwavelength grating waveguides on the silicon-on-insulator platform. We present a comprehensive numerical study in analytical modelling and 3D FDTD. Multiple waveguides variations were fabricated using an electron-beam lithography process. Figures of merit such as group index, bandwidth and loss-per-delay are examined in both theory and experiment. A maximum measured group index of 47.74 with a loss-per-delay of 103.37 dB/ns has been achieved near the wavelength of 1550 nm. A broad bandwidth of 8.82 nm was measured, in which the group index remains larger than 10. We also show that the region of slow light operation can be shifted over a large wavelength span by controlling a single design parameter.

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Silicon Photonic Circuit Design Using Rapid Prototyping Foundry Process Design Kits

Cited by 73 publications

References 60 publications

Scaling capacity of fiber-optic transmission systems via silicon photonics

Scaling capacity of fiber-optic transmission systems via silicon photonics

Robust optical physical unclonable function using disordered photonic integrated circuits

Slow Light in Subwavelength Grating Waveguides

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