Abstract:The silicon on dust substrate process is a two-step technique to produce multicrystalline silicon (mc-Si) ribbons directly from gaseous feedstock. Silicon pre-ribbons of very small grain size (ranging from nano to microcrystalline), with a porous structure and dimensions up to 25 Â 100 mm 2 , are obtained using an inline optical chemical vapor deposition (CVD) system operating at atmospheric pressure and at low temperatures (<600 C). Using silane as the gaseous precursor, nano or microcrystalline silicon layer… Show more
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