Silicon Nitride Films Deposited by RF Sputtering for Microstructure Fabrication in MEMS

Bhatt, Vivekanand; Chandra, Sudhir

doi:10.1007/s11664-009-0846-8

Cited by 27 publications

(15 citation statements)

References 28 publications

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“…Moreover, the formation of the film is related with the condensing energy of the atoms (adatoms) on the surface of the substrate. Different works have found that amorphous films are formed when the adatoms have low energy of diffuse on the surface that does not allow that they may find low energy sites for the nucleation; while, a crystalline structure may be formed when the adatoms have a high surface mobility [8,15,[80][81][82][83][84][85][86][87][88]. However, several works have found that when the growing films are exposed to bombardment of high-energy particle, the structure and properties of deposited films can be improved.…”

Section: Growth Of Thin Films Using DC Reactive Magnetron Sputtering mentioning

confidence: 99%

Effect of Silicon Content in Functional Properties of Thin Films

Vanegas¹,

Alfonso²,

Olaya³

2019

Silicon Materials

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Silicon (Si) has been the paradigm of the electronic industry, because it has been used in fabrication of different electronic circuit elements such as diodes, operational amplifiers, transistors, and in the last few decades, it has been the base material of the development of solar energy industry. However, other research fields in which the physical and chemical properties of Si have demonstrated to be relevant to applications in areas such as the mechanical, optical, electrical, and electrochemical are less known. Therefore, it is relevant to know the technology that has generated materials with new or better physical and chemical properties, such as the nanocomposite materials that have been growing in thin films. These films exhibiting new properties with respect to the bulk material and with the addition of Si, have demonstrated to improve the properties of the transition metal nitride (MeN), obtaining thin films with a high nanohardness, wear resistance, corrosion resistance, and high thermal stability. Therefore, the main objective of this chapter is to know the role that plays the incorporation Si in growth, microstructure, chemical composition, and functional properties of ZrN thin films.

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Section: Growth Of Thin Films Using DC Reactive Magnetron Sputtering mentioning

confidence: 99%

Effect of Silicon Content in Functional Properties of Thin Films

Vanegas¹,

Alfonso²,

Olaya³

2019

Silicon Materials

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“…Some authors used this treatment to enable the attachment of monolayers directly to the silicon atoms. 22,82,83 However, the monolayers formed are not strictly self-assembled as they require UV induced coupling or elevated temperatures. [84][85][86] Another reason surface etching using HF is to reform an oxide layer with a consistent depth by controlling the immersion time in piranha.…”

Section: Factors Inuencing Sam Formationmentioning

confidence: 99%

mentioning

confidence: 99%

Challenges and developments of self-assembled monolayers and polymer brushes as a green lubrication solution for tribological applications

et al. 2015

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ab Self-assembled monolayers (SAMs), after originally being investigated due to their functions in changing surface wettability, have been significantly developed over the years. Many types of SAMs have been developed on a variety of substrates. However their formation mechanism, rate and quality are found to be influenced by many factors. A range of SAMs including single-and multi-component are included in this review with focus on the nano and macro tribological properties. More recently, surface initiated polymer brushes, i.e. macromolecular assemblies attached to a substrate, have emerged to be an alternative and promising method for surface modification. The ability to tether these macromolecules to tribological contacts is key to their resistance to shear under loaded contacts. This review also covers atom transfer radical polymerisation (ATRP) and the role of this technique in developing new lubrication solutions. Particular care has been taken to include the development of lubrication solutions for silicon nitride due to the importance of this material as an engineering ceramic. This paper reviews the stateof-the-art development of SAMs and polymer brushes especially the potential opportunities and challenges in applying them in tribological contacts as a lubrication solution.

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“…[5][6][7] For the tunnel passivated layer, SiO 2 is not the only option, and it has been confirmed that Si nitride (SiN x ) can also work well in passivated contact under appropriate conditions. 8) There are many methods to form thin tunnel SiN x films, such as sputtering, 9) jet vapor deposition, 10,11) atomic layer deposition, 12) plasma-enhanced chemical vapor deposition (PECVD), [13][14][15] and direct nitridation, 16,17) some of which have been conventionally used in the industry of semiconductor devices. 18,19) Of a variety of methods, catalytic CVD (Cat-CVD), often also referred to as hot-wire CVD, may be one of the best ways for the formation of thin tunnel SiN x .…”

Section: Introductionmentioning

confidence: 99%

Tunnel nitride passivated contacts for silicon solar cells formed by catalytic CVD

Wen

Ohdaira

2021

Jpn. J. Appl. Phys.

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An ultra-thin silicon nitride (SiN x ) layer formed by catalytic chemical vapor deposition (Cat-CVD) is used to replace the Si dioxide (SiO2) layer of a tunnel oxide passivated contact solar cell. The passivation quality of crystalline Si (c-Si) with a stack of the ultra-thin SiN x and n-type hydrogenated amorphous Si (a-Si:H) or microcrystalline Si (μc-Si:H), also formed by Cat-CVD, is significantly improved by annealing at 850 °C, probably due to the formation of a back surface field layer. Cat-CVD SiN x with thicknesses of up to 2.5 nm can have sufficient tunneling conduction. The ultra-thin SiN x having functions of surface passivation and carrier tunneling, and the unification of the formation method for the tunnel SiN x and conductive layers will lead to the realization of tunnel nitride passivated contact solar cells.

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Silicon Nitride Films Deposited by RF Sputtering for Microstructure Fabrication in MEMS

Cited by 27 publications

References 28 publications

Effect of Silicon Content in Functional Properties of Thin Films

Effect of Silicon Content in Functional Properties of Thin Films

Challenges and developments of self-assembled monolayers and polymer brushes as a green lubrication solution for tribological applications

Tunnel nitride passivated contacts for silicon solar cells formed by catalytic CVD

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