2010
DOI: 10.1143/jjap.49.04dn02
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Silicon Nanowire Array Solar Cell Prepared by Metal-Induced Electroless Etching with a Novel Processing Technology

Abstract: We inexpensively fabricated vertically aligned Si nanowire solar cells using metal-induced electroless etching and a novel doping technique. Co-doping of boron and phosphorus was achieved using a spin-on-doping method for the simultaneous formation of a front-side emitter and a back surface field in a one-step thermal cycle. Nickel electroless deposition was also performed in order to form a continuous metal grid electrode on top of an array of vertically aligned Si nanowires. A highly dense array of Si nanowi… Show more

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Cited by 22 publications
(7 citation statements)
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“…1,2) Research on how to texture the surface effectively has been conducted for a long time. [3][4][5][6][7][8][9][10][11] In large-scale production, because of its lowest cost and highest yield, alkaline etching has been the most popular method. Owing to the relatively low boiling point of isopropanol (IPA), the instability of NaOH and IPA solutions often results in poor reproducibility of surface morphology.…”
Section: Introductionmentioning
confidence: 99%
“…1,2) Research on how to texture the surface effectively has been conducted for a long time. [3][4][5][6][7][8][9][10][11] In large-scale production, because of its lowest cost and highest yield, alkaline etching has been the most popular method. Owing to the relatively low boiling point of isopropanol (IPA), the instability of NaOH and IPA solutions often results in poor reproducibility of surface morphology.…”
Section: Introductionmentioning
confidence: 99%
“…For an external electrical contact, the backsided aluminum electrode was deposited (before growing SiNWs) by using the thermal deposition method onto the highly doped very thin layer inside the back of a silicon wafer. The detailed information about the fabrication of backsided electrode and SiNWs can be found in our already reported results [15,16]. For the fabrication of a stamped hybrid cell, a glass substrate was cleaned with detergent, distilled water, acetone and isopropyl alcohol.…”
Section: Methodsmentioning
confidence: 99%
“…For the top-down approach, SiNWs are carved (etched) from their substrate as shown in Figure 3. While lithography [64], direct reactive ion etching (DRIE) [65] and electroless etching (EE) [66][67][68][69] are the most frequently reported techniques for the top-bottom SiNW fabrication approach. Metal assisted chemical etching (MACE) method is comprehensively reported for the development of the SiNW array especially for PEDOT:PSS-SiNW solar cell application.…”
Section: Fabrication Of Sinwmentioning
confidence: 99%