Abstract:In the subquarter-micron range, X-ray lithography and demagnifying ion projection are promising printing techniques. For both methods special designed masks are needed which have to fulfil strong requirements including flatness, stabiltiy, defect density, transparency, and surface properties. In this paper we would like to demonstrate that silicon membrane based mask blanks are well suited to meet most of these demands. Furthermore, silicon as membrane material offers the advantage to make use of the experienc… Show more
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