Silicon Carbide Thin Film Technologies: Recent Advances in Processing, Properties, and Applications - Part I Thermal and Plasma CVD

Abstract

In Part I of a two-part report, we provide a detailed and systematic review of the latest progress in cutting-edge innovations for the silicon carbide (SiC) material system, focusing on chemical vapor deposition (CVD) thin film technologies. To this end, up-to-date results from both incremental developments in traditional SiC applications as well major advances in novel SiC usages are summarized. Emphasis is placed on new chemical sources for Si and C, particularly in the form of single source SiC precursors as well as emerging molecular and atomic scale deposition techniques, with special attention to their effects on resulting film properties and performance. The review also covers relevant research and development efforts as well as their potential impact on and role in the introduction of new technological applications. Part II will focus on findings for physical vapor deposition (PVD) as well as other deposition techniques.

Review—Silicon Carbide Thin Film Technologies: Recent Advances in Processing, Properties, and Applications: Part II. PVD and Alternative (Non-PVD and Non-CVD) Deposition Techniques

“…Part I of this two-part report examined recent peer-reviewed publications available in the public domain pertaining to the various CVD processes for SiC x thin films and nanostructures, as well as CVD modeling and mechanistic studies. 28 Part II summarized and analyzed most recent peer-reviewed reports in the public domain pertaining to both sputtering and alternative (non-CVD and non-PVD) deposition techniques for various SiC x thin film types of interest. These included the more common 4H-SiC, 6H-SiC, 3C-SiC, and a-SiC structures, as well as unique forms such as nanocrystalline rhombohedral 15R-SiC (nc-15R-SiC), 21H polytype c-SiC, 2D-SiC nanosheets and "nanoflakes," micro-crystalline SiC structures, nanocrystalline SiC structures, and SiC membranes.…”

“…Part I of this two-part report examined timely peer-reviewed publications available in the public domain pertaining to the various CVD processes for SiC x thin films and nanostructures, as well as CVD modeling and mechanistic studies. 28 Part II is organized as follows:…”

Amorphous SiC Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition for Passivation in Biomedical Devices

“…Similar topics have also been addressed in sections of a chapter by Locke et al [ 33 ] in 2012 and an article by Saddow [ 10 ] in 2022, both of which focus on crystalline SiC material more generally and only briefly discussing the a-SiC material aspects. a-SiC is also briefly addressed in a more general review by Kaloyeros and Arkles [ 53 ] in 2023. While their review provides a comprehensive look at deposition methods and applications of SiC, it does not investigate in detail the relation between process conditions and material properties.…”