Silane Removal at Ambient Temperature by Using Alumina-Supported Metal Oxide Adsorbents

Abstract

Copper, zinc, and cerium oxide adsorbents supported on alumina were used to remove silane gas (SiH 4 ). The adsorbents were prepared using a coprecipitation method and characterized by the inductively coupled plasma mass spectrometry, X-ray powder diffractometer, and Brunauer-Emmett-Teller method (BET). The silane removal efficiency and adsorption capacity of the adsorbents were investigated in this study. Test results showed that the adsorbents containing active species had a removal efficiency Ͼ99.9% for SiH 4 before breakthrough. Adsorbents containing mixed oxides (CuO-CeO 2 / Al 2 O 3 and CuO-ZnO/Al 2 O 3 ), which showed well-dispersed active species and high BET surface areas, had a greater adsorption capacity than the adsorbents containing single metal oxide. However, when the CuO-ZnO/ Al 2 O 3 adsorbents contain Ͼ40 wt% of active metal oxides, the increase of active species lowered the BET surface area leading to a decrease of the adsorption capacity. Additionally, when the content of the active metal oxides was between 20% and 40%, the CuO-ZnO/Al 2 O 3 adsorbents demonstrated higher adsorption capacity.

Heavy metal adsorption with biogenic manganese oxides generated by Pseudomonas putida strain MnB1

“…The small size, poorly crystalline structure, and the high surface area of BMO can make the excellent adsorbents or catalysts [23]. For the Mn oxide with poorly crystallinity, the exchangeable charge-balancing cations (i.e., Mn 2+ and H + ) are loosely involved in the structure to compensate the charge balance.…”

Metal Loaded Zeolite Adsorbents for Phosphine Removal

“…The maximum adsorption capacity per loaded metal mass obtained in this study is much higher than literature data using CuO for adsorbing hydride gases. 16,17 In the authors' prior study 17 on adsorbing SiH 4 , the maximum adsorption capacity of only 0.15 mol of SiH 4 /mol of CuO was observed with 40% (w/w) CuO supported on Al 2 O 3 adsorbents. This may be due to that the surface area of the CuO/Al 2 O 3 adsorbents 17 was only 121 m 2 /g.…”

Implementation Principles of Optimal Control Technology for the Reduction of Greenhouse Gases in Semiconductor Industry

“…These innovative solutions prioritize localized emission reduction, recognizing that it is more effective to tackle emissions at the source before they disperse and contaminate the environment further. Through the utilization of advanced abatement methodologies, the industry aims to achieve precise and accurate calculations of Fluorinated Compounds (FCs) emissions by connecting each emission stream to a dedicated local scrubber [9][10]. Table 1 outlines the important features of these advanced abatement methods, shedding light on their role in the semiconductor manufacturing process.…”