2021
DOI: 10.1002/app.51376
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Silacyclobutane‐functionalized cyclosiloxanes as photoactive precursors for high thermal stability, low dielectric constant and low dielectric loss polymers

Abstract: Low dielectric photoactive materials have significant potential as components in future microelectronics. Although a number of photosensitive groups have been used to construct photopatternable materials, it remains challenging to introduce these groups into polymer chains via facile yet controlled polymerization techniques. The present work demonstrates the synthesis of a new class of photoactive cyclosiloxane monomers having hybrid siloxane-carbosilane main chains. These compounds can be cured by applying ul… Show more

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Cited by 3 publications
(2 citation statements)
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“…And the thermal stability can be improved by introducing cyclosilioxanes monomer structures . Although the introduction of fluorinated monomers and the use of nanostructures can improve the hydrophobicity of polysiloxanes, the fluorine-free silicon-based polymer film without additional surface structures still struggles to achieve hydrophobicity, let alone dielectric properties. …”
Section: Introductionmentioning
confidence: 99%
“…And the thermal stability can be improved by introducing cyclosilioxanes monomer structures . Although the introduction of fluorinated monomers and the use of nanostructures can improve the hydrophobicity of polysiloxanes, the fluorine-free silicon-based polymer film without additional surface structures still struggles to achieve hydrophobicity, let alone dielectric properties. …”
Section: Introductionmentioning
confidence: 99%
“…Cyclosiloxanes can be used as an initial reagent for the preparation of siloxane homo- and copolymer rubbers and liquids [ 1 , 2 , 3 , 4 ], as well as functional precursors for molecular design [ 5 , 6 , 7 , 8 , 9 ], cross-linking reagents [ 10 ], flame retardants [ 11 ], components of compositions for dry cleaning and detergents [ 12 , 13 , 14 ], solvents for coloring fabrics [ 15 , 16 , 17 , 18 , 19 ] and in cosmetics for various purposes, including skin and hair care products, deodorants/antiperspirants, makeup products, etc. [ 20 , 21 , 22 , 23 ].…”
Section: Introductionmentioning
confidence: 99%