2018
DOI: 10.1063/1.5005587
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Significant improvement in the electrical characteristics of Schottky barrier diodes on molecularly modified Gallium Nitride surfaces

Abstract: III-Nitride semiconductors face the issue of localized surface states, which causes fermi level pinning and large leakage current at the metal semiconductor interface, thereby degrading the device performance. In this work, we have demonstrated the use of a Self-Assembled Monolayer (SAM) of organic molecules to improve the electrical characteristics of Schottky barrier diodes (SBDs) on n-type Gallium Nitride (n-GaN) epitaxial films. The electrical characteristics of diodes were improved by adsorption of SAM of… Show more

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Cited by 26 publications
(21 citation statements)
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References 33 publications
(28 reference statements)
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“…Coatings 2020, 10, x FOR PEER REVIEW 5 of 15 confirmation of Ga-N bond in GaN [30]. The small peak at 1,117.8 eV was contributed to the Ga-O bonding.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Coatings 2020, 10, x FOR PEER REVIEW 5 of 15 confirmation of Ga-N bond in GaN [30]. The small peak at 1,117.8 eV was contributed to the Ga-O bonding.…”
Section: Resultsmentioning
confidence: 99%
“…The XPS survey data and the XPS peaks of Ga, Sb, and N elements shown in Figure 1 were investigated with the low intensity peak of C 1s at 284.6 eV in binding energy as a reference. Figure 2b shows the high resolution XPS spectrum with strong Ga 2p1/2 and Ga 2p3/2 peaks at 1145.7 eV and 1118.81 eV, respectively, for the confirmation of Ga-N bond in GaN [30]. The small peak at 1117.8 eV was contributed to the Ga-O bonding.…”
Section: Introductionmentioning
confidence: 95%
“…When the molecules are adsorbed onto the surface of the semiconductor, they tune either the surface band-bending 25,26 (surface potential generated due to the surface charge) of the semiconductor or the electron affinity 27,28 or sometimes both. 29 The insertion of the organic molecules at the metalsemiconductor interfaces of Schottky contacts on some semiconductors has also been demonstrated to modify the SBH [30][31][32][33] and reduce the reverse leakage current, significantly. 33 Apart from SBH modification, the application of metal/molecular layer/semiconductor structures was also seen when organic molecules of metallated Porphyrin were used as copper metal diffusion barriers for SiO 2 -Si based CMOS technologies.…”
Section: Introductionmentioning
confidence: 99%
“…29 The insertion of the organic molecules at the metalsemiconductor interfaces of Schottky contacts on some semiconductors has also been demonstrated to modify the SBH [30][31][32][33] and reduce the reverse leakage current, significantly. 33 Apart from SBH modification, the application of metal/molecular layer/semiconductor structures was also seen when organic molecules of metallated Porphyrin were used as copper metal diffusion barriers for SiO 2 -Si based CMOS technologies. 34 Not only the gate electrode, but the application of organic molecules has also been reported to modify the source and drain electrodes on graphene based field-effect transistors.…”
Section: Introductionmentioning
confidence: 99%
“…In addition, an increase in apparent surface roughness (estimated from an effective medium approximation of the layer thickness) was observed on the APTES-treated u-GaN ( C ) and p-GaN ( A ) surfaces from ellipsometry measurements ( Table S3 ). The presence of the APTES layers can be a plausible reason for the change in surface properties between the blank and treated surfaces [ 45 ].…”
Section: Resultsmentioning
confidence: 99%