2000
DOI: 10.1007/bf03215489
|View full text |Cite
|
Sign up to set email alerts
|

Significance of inclusions in electroplated gold films for electronics applications

Abstract: Minute amounts of metallic as well as non-metallic inclusions significantly affect both bulk and surface properties of the electroplated gold films being used by the electronics industry. Surface effects are caused by the presence of extraneous materials diffused out from the interior to the surface, while bulk effects are brought about by the influence of inclusions on the microstructure of the gold films. This article reviews the current status of understanding of such inclusion effects in both soft and hard… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
24
0
1

Year Published

2004
2004
2023
2023

Publication Types

Select...
9

Relationship

2
7

Authors

Journals

citations
Cited by 35 publications
(25 citation statements)
references
References 29 publications
0
24
0
1
Order By: Relevance
“…This electrolyte was originally proposed by Osaka and co-workers who used it to deposit soft gold, which was comparable to gold deposited from a sulphite electrolyte [18][19][20].…”
Section: Introductionmentioning
confidence: 99%
“…This electrolyte was originally proposed by Osaka and co-workers who used it to deposit soft gold, which was comparable to gold deposited from a sulphite electrolyte [18][19][20].…”
Section: Introductionmentioning
confidence: 99%
“…A clear proof on the nature of the latter ones could not be performed till now and will be the object of further studies in which these precipitates will be directly harvested by means of nano tweezers in a SEM. Further experiments should concentrate on the formation of smoother deposits by application of less negative overpotentials for the electrodeposition of Au(I) ions, or the use of alternative electrolyte solutions [22][23][24][25]. Due to the passivation of the matrix, only the wires and later the gold deposits remain electrochemically active which gives this approach an inherent advantage over an alternative route in which the gold electrodes are directly produced as the minor phase of a directionally transformed eutectoid system [26,27].…”
Section: Investigations On the Nucleation And Growth Of Gold Into W Nmentioning
confidence: 97%
“…It is polycrystalline in microstructure with its grain size in the range of 20-30 nm, and its hardness is as high as 170-200 kg mm -2 in Knoop hardness compared to 50-80 kg mm -2 for pure, soft gold [15]. The detailed study of the hardening mechanism of the hard gold performed by Lo et al [16] shows that the major factor determining the hardness is the grain size.…”
Section: Electroplating Of Amorphous Gold Alloysmentioning
confidence: 99%