2008 IEEE International Electron Devices Meeting 2008
DOI: 10.1109/iedm.2008.4796799
|View full text |Cite
|
Sign up to set email alerts
|

SiGe HBT module with 2.5 ps gate delay

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
16
0

Year Published

2009
2009
2012
2012

Publication Types

Select...
5
3

Relationship

1
7

Authors

Journals

citations
Cited by 35 publications
(16 citation statements)
references
References 9 publications
0
16
0
Order By: Relevance
“…The base is 17.5 nm thick and the Ge content has the form of a box profile with a maximum Ge content of 18%. Basically, it is tried to follow the state-of-the-art doping and Ge profiles shown in [69].…”
Section: Sige Hbtmentioning
confidence: 99%
“…The base is 17.5 nm thick and the Ge content has the form of a box profile with a maximum Ge content of 18%. Basically, it is tried to follow the state-of-the-art doping and Ge profiles shown in [69].…”
Section: Sige Hbtmentioning
confidence: 99%
“…Although the BE solver can handle the abrupt change of the Ge content without any difficulties, the flanks are slightly graded to avoid problems with the DD and HD models. Note that the base length of state-of-the-art SiGe HBTs is around 20 nm [2]. The Gummel plot is shown in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…Very fast SiGe HBTs with cutoff and maximum oscillation frequencies of more than 300 GHz and gate delays as low as 2.5 ps have been demonstrated in the past [1], [2]. Even faster devices have been investigated by device simulation [3], [4].…”
Section: Introductionmentioning
confidence: 99%
“…A second architecture explored in the DOTFIVE project is the one proposed in [22]. Although it looks quite different from the G1G architecture at first sight, it is actually a complementary approach.…”
Section: Novel Device Architecturesmentioning
confidence: 98%