2017
DOI: 10.1021/acs.nanolett.6b03820
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Side Gate Tunable Josephson Junctions at the LaAlO3/SrTiO3 Interface

Abstract: Novel physical phenomena arising at the interface of complex oxide heterostructures offer exciting opportunities for the development of future electronic devices. Using the prototypical LaAlO3/SrTiO3 interface as a model system, we employ a single-step lithographic process to realize gate-tunable Josephson junctions through a combination of lateral confinement and local side gating. The action of the side gates is found to be comparable to that of a local back gate, constituting a robust and efficient way to c… Show more

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Cited by 46 publications
(52 citation statements)
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“…The narrow 10-μm gap converts a relatively small voltage to an intense and localized average electric field (1 V ≈ 100 kV/m) whose magnitude is further enhanced in the proximity of the CPW by the inhomogeneous density of electric-field lines (see Supplemental Material S2 [20]). A similar local gating scheme was used recently in transport experiments in oxide systems [22][23][24]. The modification of the local dielectric constant caused by the dc bias results in a change of the total capacitance of the resonator and a corresponding shift of its resonance frequencies.…”
Section: Electric-field Dependence Of ε Rmentioning
confidence: 99%
“…The narrow 10-μm gap converts a relatively small voltage to an intense and localized average electric field (1 V ≈ 100 kV/m) whose magnitude is further enhanced in the proximity of the CPW by the inhomogeneous density of electric-field lines (see Supplemental Material S2 [20]). A similar local gating scheme was used recently in transport experiments in oxide systems [22][23][24]. The modification of the local dielectric constant caused by the dc bias results in a change of the total capacitance of the resonator and a corresponding shift of its resonance frequencies.…”
Section: Electric-field Dependence Of ε Rmentioning
confidence: 99%
“…Alternatively, to avoid possible damage due to processing on the samples after the growth of the toplayer, either metallic gates can be used as a part of the mask structure 17 or nearby regions of the 2DES itself can be utilized for gating. 20,26 Figure 4 demonstrates the latter approach using the PMMA as the patterning mask for defining a 500 nm wide channel with nearby 2DES side-gates as shown in Fig. 1(a).…”
mentioning
confidence: 99%
“…1(a). 26 The separation between the gates and the channel was likewise 500 nm. The conductance of the devices as a function of the voltage V SG applied to the side-gates and back-gate is shown in Figs. 4(b)-4(d) for a temperature of 20 mK.…”
mentioning
confidence: 99%
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“…Owing to its stable physical and chemical properties, lanthanum aluminate has intensive applications as substrates for magnetic thin films, superconductors, and luminescent host materials . Hence, we selected the flexible Al 2 O 3 ‐La 2 O 3 nanofibrous membranes as substrate.…”
Section: Resultsmentioning
confidence: 99%