2007
DOI: 10.1109/radar.2007.374395
|View full text |Cite
|
Sign up to set email alerts
|

SiC and GaN Wide Bandgap Device Technology Overview

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
17
0
1

Year Published

2008
2008
2023
2023

Publication Types

Select...
6
1
1

Relationship

0
8

Authors

Journals

citations
Cited by 41 publications
(21 citation statements)
references
References 1 publication
0
17
0
1
Order By: Relevance
“…The current GaN development is mostly driven by commercial applications for broadband wireless access, using discrete devices, and only very few HPA MMICs around Sband are presented so far [6].…”
Section: Gan Technology In Tr-modulesmentioning
confidence: 99%
“…The current GaN development is mostly driven by commercial applications for broadband wireless access, using discrete devices, and only very few HPA MMICs around Sband are presented so far [6].…”
Section: Gan Technology In Tr-modulesmentioning
confidence: 99%
“…GaN is a wide band gap (~3.4 eV at room temperature) semiconductor with a promising combination of material properties including a high electric breakdown field, good electron mobility, high saturation velocity, relatively high thermal conductivity, and is stable at high operating temperatures [1]; all of which contribute to making these devices very suitable for RF devices where high power and high frequency operation are needed [2,3]. Development and fabrication of reliable AlGaN/GaN HEMTs has significantly advanced in recent years to enable the production of high quality, commercially available devices in a wide variety of high power and high frequency applications.…”
Section: Introductionmentioning
confidence: 99%
“…Monolithic microwave integrated circuits (MMIC) based on gallium nitride (GaN) high electron mobility transistors (HEMT) have the advantage of providing broadband power performance (Milligan et al, 2007). The high breakdown voltage and high current density of GaN devices provide higher power density than the traditional technology based on GaAs.…”
Section: Introductionmentioning
confidence: 99%
“…GaN technological process is still immature and complex. However, gate lithography resolution lower than 0.2 m and AlGaN/GaN epi-structures on 100-mm SiC substrates are already available (Milligan et al, 2007). …”
mentioning
confidence: 99%