2017
DOI: 10.1039/c7tc02175e
|View full text |Cite
|
Sign up to set email alerts
|

Si-doped zinc oxide transparent conducting oxides; nanoparticle optimisation, scale-up and thin film deposition

Abstract: Si-doped ZnO was made by a continuous hydrothermal method and deposited by spin coating; ρ = 2.4 × 10−3 Ω cm, Tvis > 80%.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

1
1
0

Year Published

2019
2019
2022
2022

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 11 publications
(2 citation statements)
references
References 41 publications
1
1
0
Order By: Relevance
“…The excess electrons in Si-doped ZnO cause it to have higher carrier density than indium doping, which leads to improved mobility of Si-doped ZnO (10−30 cm 2 /V s) than ZnO films (∼11 cm 2 /V s). 36 Similarly, in this work, the Mn dopant is also incorporated in the +4 oxidation state within the ZnO lattice, which gives two free electrons for each Mn Zn defect state produced, which is well-matched with our SCLC mobility measurements (discussed later).…”
Section: Resultssupporting
confidence: 80%
See 1 more Smart Citation
“…The excess electrons in Si-doped ZnO cause it to have higher carrier density than indium doping, which leads to improved mobility of Si-doped ZnO (10−30 cm 2 /V s) than ZnO films (∼11 cm 2 /V s). 36 Similarly, in this work, the Mn dopant is also incorporated in the +4 oxidation state within the ZnO lattice, which gives two free electrons for each Mn Zn defect state produced, which is well-matched with our SCLC mobility measurements (discussed later).…”
Section: Resultssupporting
confidence: 80%
“…Howard et al studied the role of Si 4+ incorporation in the ZnO lattice for TCO applications, and they revealed that the Si Zn defect in the ZnO lattice results in two free electrons being generated unlike doping with trivalent dopants (In 3+ ) which gives only one free electron. The excess electrons in Si-doped ZnO cause it to have higher carrier density than indium doping, which leads to improved mobility of Si-doped ZnO (10–30 cm 2 /V s) than ZnO films (∼11 cm 2 /V s) . Similarly, in this work, the Mn dopant is also incorporated in the +4 oxidation state within the ZnO lattice, which gives two free electrons for each Mn Zn defect state produced, which is well-matched with our SCLC mobility measurements (discussed later).…”
Section: Resultsmentioning
confidence: 99%