Abstract:In this paper, we develop a novel fracturing algorithm with shot overlap that is tailored towards rectilinear masks, such as those generated via edge based OPC software. Our proposed fracturing algorithm generates both the location and dosage of shots given the mask layout and mask making parameters. In the first step we heuristically cover the mask polygon with overlapping shots. Next, we incorporate the forward scattering and resist model in a least squares problem to compute the best dosage for all shots. F… Show more
“…This is consistent with recent work on mask fracturing [16] [17]. We set the CD tolerance γ = 2nm, and the minimum and maximum dimensions of a shot are 13nm and 1000nm, respectively.…”
Aggressive resolution enhancement techniques such as inverse lithography (ILT) often lead to complex, non-rectilinear mask shapes which make mask writing extremely slow and expensive. To reduce shot count of complex mask shapes, mask writers allow overlapping shots, due to which the problem of fracturing mask shapes with minimum shot count is NP-hard. The need to correct for e-beam proximity effect makes mask fracturing even more challenging. Although a number of fracturing heuristics have been proposed, there has been no systematic study to analyze the quality of their solutions. In this work, we propose a new method to generate benchmarks with known optimal solutions that can be used to evaluate the suboptimality of mask fracturing heuristics. We also propose a method to generate tight upper and lower bounds for actual ILT mask shapes by formulating mask fracturing as an integer linear program and solving it using branch and price. Our results show that a state-of-the-art prototype [version of] capability within a commercial EDA tool for e-beam mask shot decomposition can be suboptimal by as much as 3.7× for generated benchmarks, and by as much as 3.6× for actual ILT shapes.
“…This is consistent with recent work on mask fracturing [16] [17]. We set the CD tolerance γ = 2nm, and the minimum and maximum dimensions of a shot are 13nm and 1000nm, respectively.…”
Aggressive resolution enhancement techniques such as inverse lithography (ILT) often lead to complex, non-rectilinear mask shapes which make mask writing extremely slow and expensive. To reduce shot count of complex mask shapes, mask writers allow overlapping shots, due to which the problem of fracturing mask shapes with minimum shot count is NP-hard. The need to correct for e-beam proximity effect makes mask fracturing even more challenging. Although a number of fracturing heuristics have been proposed, there has been no systematic study to analyze the quality of their solutions. In this work, we propose a new method to generate benchmarks with known optimal solutions that can be used to evaluate the suboptimality of mask fracturing heuristics. We also propose a method to generate tight upper and lower bounds for actual ILT mask shapes by formulating mask fracturing as an integer linear program and solving it using branch and price. Our results show that a state-of-the-art prototype [version of] capability within a commercial EDA tool for e-beam mask shot decomposition can be suboptimal by as much as 3.7× for generated benchmarks, and by as much as 3.6× for actual ILT shapes.
Single beam mask writer architectures have satisfied mask patterning requirements for decades, but there is now great interest in multibeam mask writers to handle the throughput and resolution demands arising from the needs of sub-10 nm technology nodes. Future mask writers must transmit terabits of information per second and handle petabytes of data. For electron-beam direct write (EBDW) lithography systems parallelism and lossless layout image compression are techniques which have been considered together to approach the data transfer problem. For the multibeam mask architectures proposed by IMS Nanofabrication and NuFlare, the data being transmitted are significantly processed and modified from the initial proximity-corrected layout images, so the data compression problem the authors consider for this application appears to be for a new type of data. Just as the throughput requirements for EBDW lithography systems necessitate the lossless data compression decoders to swiftly reproduce the layout images from their encodings it is likewise interesting to study simple and effective lossless data compression algorithms for multibeam mask writers. The authors will examine how parallelism affects the total beam compressed data for a family of idealized multibeam architectures inspired by the IMS Nanofabrication eMET series.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.