Short-Range Six-Axis Interferometer Controlled Positioning for Scanning Probe Microscopy

Lazar, Josef; Klapetek, Petr; Valtr, Miroslav; Hrabina, Jan; Buchta, Zdeněk; Čížek, Martin; Oulehla, Jindřich; Šerý, Mojmı́r

doi:10.3390/s140100877

Cited by 12 publications

(4 citation statements)

References 27 publications

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“…The Scanning method of system design in this study makes use of object detection. The process of finding objects, whether they move or not, like people or things, is known as object detection [38]. Object tracking, which aims to identify or track the position of moving objects in an image sequence, is one application of image processing that can be used in daily life [39].…”

Section: B Scanning Methodsmentioning

confidence: 99%

Sustainable Smart Home IoT to Open and Close the House Fence using a Scanning Method

Purwanto,

Nugraha,

Ferdiansyah

et al. 2023

IJACSA

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A home that is connected to the Internet allows all of its appliances and systems to communicate with one another via the Internet of Things (IoT), making it a component of a sustainable smart home. The issue with this study's findings is that some homes still utilize manual gates, which must be opened and closed by pushing a gate. Considering that a building's gate is its primary form of security, this is viewed as being less effective. Additional locks are required on the fence to overcome its frail defenses, which do not deter criminals. This project aims to create a smart home by using the internet to automate the process of opening and closing home gates based on IoT. Prototyping is a strategy used in software development, whereas card barcode objects are found using scanning. The findings demonstrated that Radio Frequency Identification (RFID), which is connected to a smartphone as a communication medium between the device and the user, is connected to each other between the microcontroller and the stepper motor so that it can operate the home gate automatically. The test findings indicate that when the user taps in the RFID card as the drive for the gate, the reaction time of the RFID to the stepper is between 7.35 and 10.10 seconds. Future research can use long-range RFID technology, which has a reading distance of more than 5-12 meters with a radio frequency band refarming process of 800 -900 Mhz for any smart home or smart building. The accuracy of reading RFID cards with an RFID reader is about 1 -5 cm, which is the limitation in this study. According to the test findings, it can be said that the development of an automatic fence control system increases the effectiveness of home security and allows for direct control from a smartphone. Using a Long-RFID instrument with a reading precision distance of 5-12 meters and a radio frequency band refarming method of 800-900 Mhz is anticipated to be sustainable in this research.

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Section: B Scanning Methodsmentioning

confidence: 99%

Sustainable Smart Home IoT to Open and Close the House Fence using a Scanning Method

Purwanto,

Nugraha,

Ferdiansyah

et al. 2023

IJACSA

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“…For instance, the instrument may be used for the calibration and characterization of grid patterns on calibration wafers, or the calibration of grid plates used for optical encoder based metrology. In fact, the need for such large dynamic range AFM systems is highlighted in several nanometrology roadmaps [9].…”

Section: Discussionmentioning

confidence: 99%

Large dynamic range Atomic Force Microscope for overlay improvements

et al. 2016

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Nowadays most overlay metrology tools assess the overlay performance based on marker features which are deposited next to the functional device features within each layer of the semiconductor device. However, correct overlay of the relatively coarse marker features does not directly guarantee correct overlay of the much smaller device features. This paper presents the development of a tool that allows to measure the relative distance between the marker and device features within each layer of the semiconductor device, which can be used to improve the overlay at device feature level. In order to be effective, the marker to device feature distance should be measured with sub-nanometer measurement uncertainty over several millimeters range. Furthermore, the tool should be capable of profiling the marker features to allows prediction of the location interpretation of the optical diffraction based alignment sensors, which are sensitive for potential asymmetry of the marker features. To enable this, a highly stable Atomic Force Microscope system is being developed. The probe is positioned relative to the wafer with a 6DOF controlled hexapod stage, which has a relatively large positioning range of 8x8mm. The position and orientation of this stage is measured relative to the wafer using 6 interferometers via a highly stable metrology frame. A tilted probe concept is utilized to allow profiling of the high aspect ratio marker and device features. Current activities are aimed at demonstrating the measurement capabilities of the developed AFM system.

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“…For comparison with the measurements at our imaging Mueller matrix ellipsometry setup, we performed measurements using a metrological scanning probe microscope (SPM) [31] and a commercial AFM with a high aspect ratio probe that was calibrated using the metrological SPM and a transfer standard. The scan size and resolution were adapted to the feature size, typically using 1,024 by 1,024 pixels per image.…”

Section: Afm Measurementsmentioning

confidence: 99%

Mueller Matrix Ellipsometric Approach on the Imaging of Sub-Wavelength Nanostructures

et al. 2022

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Conventional spectroscopic ellipsometry is a powerful tool in optical metrology. However, when it comes to the characterization of non-periodic nanostructures or structured fields that are much smaller than the illumination spot size, it is not well suited as it integrates the results over the whole illuminated area. Instead, imaging ellipsometry can be applied. Especially imaging Mueller matrix ellipsometry is highly useful in nanostructure characterization and defect inspection, as it is capable to measure the complete Mueller matrix for each pixel in a microscope image of the sample. It has been shown that these so-called Mueller matrix images can help to distinguish geometrical features of nanostructures in the sub-wavelength regime due to visible differences in off-diagonal matrix elements. To further investigate the sensitivity of imaging Mueller matrix ellipsometry for sub-wavelength sized features, we designed and fabricated a sample containing geometrical nanostructures with lateral dimensions ranging from 50 to 5,000 nm. The structures consist of square and circular shapes with varying sizes and corner rounding. For the characterization of their Mueller matrix images, we constructed an in-house Mueller matrix microscope capable of measuring the full Mueller matrix for each pixel of a CCD camera, using an imaging system and a dual-rotating compensator configuration for the ellipsometric system. The samples are illuminated at 455 nm wavelength and the measurements can be performed in both transmission and reflection. Using this setup, we systematically examine the sensitivity of Mueller matrix images to small features of the designed nanostructures. Within this contribution, the results are compared with traceable atomic force microscopy measurements and the suitability of this measurement technique in optical nanometrology is discussed. AFM measurements confirm that the fabricated samples closely match their design and are suitable for nanometrological test measurements. Mueller matrix images of the structures show close resemblance to numerical simulations and significant influence of sub-wavelength features to off-diagonal matrix elements.

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Short-Range Six-Axis Interferometer Controlled Positioning for Scanning Probe Microscopy

Cited by 12 publications

References 27 publications

Sustainable Smart Home IoT to Open and Close the House Fence using a Scanning Method

Sustainable Smart Home IoT to Open and Close the House Fence using a Scanning Method

Large dynamic range Atomic Force Microscope for overlay improvements

Mueller Matrix Ellipsometric Approach on the Imaging of Sub-Wavelength Nanostructures

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