Shear thickening and defect formation of fumed silica CMP slurries

Crawford, Nathan C.; Williams, S. Kim Ratanathanawongs; Boldridge, David; Liberatore, Matthew W.

doi:10.1016/j.colsurfa.2013.06.003

Cited by 29 publications

(24 citation statements)

References 39 publications

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“…The friction among fiber bundles and fibers resists the penetration against the spike, during which the stress reaches the maximum, which is exemplified by the first peak in Figure 13(a), and plummets subsequently. When the spike finally penetrates the fabric, the stress stops changing [40]. The biggest difference between the spike and the knife is that the knife has a blade on one side, which acts on the fabric to produce shearing force for cutting the yarn.…”

Section: Resultsmentioning

confidence: 99%

Rheological response and quasi-static stab resistance of STF/MWCNTs-impregnated aramid fabrics with different textures

Cen

Peng

et al. 2019

Journal of Industrial Textiles

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Terrorist attacks occur constantly, which subsequently arouses awareness of self-protection. In order to alleviate the harm caused by sharp objects of knives and daggers, a design of flexible stab-resistant materials that are impregnated with the shear thickening fluid (STF)/multi-walled carbon nanotubes (MWCNTs) system and different texture of fabrics is presented. STF/MWCNTs are composed of polyethylene glycol (PEG 200) as the dispersion medium and silica (SiO2) of 12 nm and 75 nm as disperse phase as well as MWCNTs as supplementary reinforcement, in expectation to provide the aramid fabrics with high strengths, low critical shear rate, and a short thickening response time. The textures of aramid fabrics—plain (P), twill (T), satin (S), or basket (B) weave—are saturated in the STF/MWCNTs system. The synergetic influences of silica size and texture on tensile strength, quasi-static knife, and spike stab resistances of the STF/MWCNTs-impregnated aramid fabrics are examined. Results show that the plain aramid fabric immersed in the STF/MWCNTs system containing 12 nm SiO2(SM12) exhibit the maximum tensile strength and quasi-static knife stab resistance, 14.7 MPa and 8.9 MPa, respectively, which is 1.15 and 1.43 times higher than pure aramid fabrics. Moreover, the basket-weave aramid fabric immersed in the STF/MWCNTs system containing 12 nm SiO2have the maximum quasi-static spike stab resistance of 17.12 MPa compared to other textures of fabrics, which is 1.05 times higher than those immersed in the 75 nm SiO2STF/MWCNTs (SM75) system and 1.33 times higher than that of pure basket aramid fabrics.

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Section: Resultsmentioning

confidence: 99%

Rheological response and quasi-static stab resistance of STF/MWCNTs-impregnated aramid fabrics with different textures

Cen

Peng

et al. 2019

Journal of Industrial Textiles

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“…However, Lortz et al found that the viscosity of silica slurries was constant, like Newtonian fluids, only up to a shear rate of 10,000 s −1 and increased significantly for higher shear rates in the range of 200,000-300,000 s −1 [33]. Later, Crawford et al developed a new methodology to in situ measure the rheological behavior of CMP slurries (in situ rheo-polishing setup) while polishing the wafer [34]. They observed a fivefold increase in the viscosity of the silica slurries in the presence of 0.15 M KCl with increasing shear rate (≥10,000 s −1 ).…”

Section: Lubrication Modelsmentioning

confidence: 99%

“…In situ rheo-polishing setup with a parallel-plate geometry was developed by Crawford et al [Fig. 8(a); Table 2] [34]. The top was constructed of a disposable plate, while a 2-in diameter SiO 2 blanket wafer was inserted into the fixture housing with 2 mL of slurry.…”

Section: The Effect Of Temperature Changes On the Chemical And Mechanical Reactions During Polishingmentioning

confidence: 99%

A review on chemical and mechanical phenomena at the wafer interface during chemical mechanical planarization

Seo

2021

Journal of Materials Research

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As the minimum feature size of integrated circuit elements has shrunk below 7 nm, chemical mechanical planarization (CMP) technology has grown by leaps and bounds over the past several decades. There has been a growing interest in understanding the fundamental science and technology of CMP, which has continued to lag behind advances in technology. This review paper provides a comprehensive overview of various chemical and mechanical phenomena such as contact mechanics, lubrication models, chemical reaction that occur between slurry components and films being polished, electrochemical reactions, adsorption behavior and mechanism, temperature effects, and the complex interactions occurring at the wafer interface during polishing. It also provides important insights into new strategies and novel concepts for next‐generation CMP slurries. Finally, the challenges and future research directions related to the chemical and mechanical process and slurry chemistry are highlighted.

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“…STFs are specific type of non-Newtonian fluids whose viscosity increases dramatically with increasing shear rate and act like solids. However, after removal of shear stress, STFs reverse their status to liquid-like as soon as shear removes [19][20][21][22][23]. Extensive analysis of failure modes during the quasi-static puncture and yarn pull-out experiments as well as the rheological properties of several STF systems have shown that improved ballistic and stab resistance performance in STF-treated fabrics is extremely attributed to the inherent shear-thickening behavior.…”

Section: Introductionmentioning

confidence: 99%

The influence of carbon nanotubes on quasi-static puncture resistance and yarn pull-out behavior of shear-thickening fluids (STFs) impregnated woven fabrics

Hasanzadeh

Mottaghitalab

Babaei

et al. 2016

Composites Part A: Applied Science and Manufacturing

110

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Shear thickening and defect formation of fumed silica CMP slurries

Cited by 29 publications

References 39 publications

Rheological response and quasi-static stab resistance of STF/MWCNTs-impregnated aramid fabrics with different textures

Rheological response and quasi-static stab resistance of STF/MWCNTs-impregnated aramid fabrics with different textures

A review on chemical and mechanical phenomena at the wafer interface during chemical mechanical planarization

The influence of carbon nanotubes on quasi-static puncture resistance and yarn pull-out behavior of shear-thickening fluids (STFs) impregnated woven fabrics

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