2020
DOI: 10.3390/polym13010055
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Shear Stress-Triggered Deformation of Microparticles in a Tapered Microchannel

Abstract: We demonstrate that it is possible to produce microparticles with high deformability while maintaining a high effective volume. For significant particle deformation, a particle must have a void region. The void fraction of the particle allows its deformation under shear stress. Owing to the importance of the void fraction in particle deformation, we defined an effective volume index (V*) that indicates the ratio of the particle’s total volume to the volumes of the void and material structures. We chose polyeth… Show more

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Cited by 4 publications
(1 citation statement)
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“…Moreover, the micro/nano-structural substrates of different sizes and shapes [ 7 , 8 ] prepared by different processing methods (top-down, bottom-up) have high SERS enhancement factors and can be used for medical detection. At present, microstructural components, such as micro-nano gratings [ 9 , 10 , 11 , 12 , 13 , 14 ], polarizers, and lenses, can be completed by technologies such as nano-imprint, exposure, and development [ 15 , 16 , 17 , 18 , 19 , 20 , 21 , 22 , 23 , 24 , 25 , 26 , 27 , 28 , 29 , 30 , 31 , 32 , 33 , 34 , 35 ]. However, there is a problem of material selection if etching is used for microstructure fabrication.…”
Section: Introductionmentioning
confidence: 99%
“…Moreover, the micro/nano-structural substrates of different sizes and shapes [ 7 , 8 ] prepared by different processing methods (top-down, bottom-up) have high SERS enhancement factors and can be used for medical detection. At present, microstructural components, such as micro-nano gratings [ 9 , 10 , 11 , 12 , 13 , 14 ], polarizers, and lenses, can be completed by technologies such as nano-imprint, exposure, and development [ 15 , 16 , 17 , 18 , 19 , 20 , 21 , 22 , 23 , 24 , 25 , 26 , 27 , 28 , 29 , 30 , 31 , 32 , 33 , 34 , 35 ]. However, there is a problem of material selection if etching is used for microstructure fabrication.…”
Section: Introductionmentioning
confidence: 99%