Polarity-controlled
growth of ZnO by chemical bath deposition provides
a method for controlling the crystal orientation of vertical nanorod
arrays. The ability to define the morphology and structure of the
nanorods is essential to maximizing the performance of optical and
electrical devices such as piezoelectric nanogenerators; however,
well-defined Schottky contacts to the polar facets of the structures
have yet to be explored. In this work, we demonstrate a process to
fabricate metal–semiconductor–metal device structures
from vertical arrays with Au contacts on the uppermost polar facets
of the nanorods and show that the O-polar nanorods (∼0.44 eV)
have a greater effective barrier height than the Zn-polar nanorods
(∼0.37 eV). Oxygen plasma treatment is shown by cathodoluminescence
spectroscopy to affect midgap defects associated with radiative emissions,
which improves the Schottky contacts from weakly rectifying to strongly
rectifying. Interestingly, the plasma treatment is shown to have a
much greater effect in reducing the number of carriers in O-polar
nanorods through quenching of the donor-type substitutional hydrogen
on oxygen sites (HO) when compared to the zinc-vacancy-related
hydrogen defect complexes (VZn−nH) in Zn-polar nanorods that evolve to lower-coordinated complexes.
The effect on HO in the O-polar nanorods coincides with
a large reduction in the visible-range defects, producing a lower
conductivity and creating the larger effective barrier heights. This
combination can allow radiative losses and charge leakage to be controlled,
enhancing devices such as dynamic photodetectors, strain sensors,
and light-emitting diodes while showing that the O-polar nanorods
can outperform Zn-polar nanorods in such applications.