Abstract:We show that N-doped ZnO films grown on sapphire can exhibit significant (∼1018 cm−3) room-temperature p-type behavior when sufficient nitrogen (N) is incorporated and the material is annealed appropriately. Substitutional N on the oxygen (O) sublattice is a deep acceptor; however, shallow acceptor complexes involve N, H, and zinc vacancies (VZn). Combining secondary ion mass spectrometry, Raman-scattering, photoluminescence, and Hall-effect data, we establish the evolution of N from its initial incorporation … Show more
“…Since there is band bending close to the interface, the hole quasi-Fermi level may be close enough to the VB to allow the E V + 0.16 eV acceptors to contribute to hole generation. This trap matches quite well that observed by Reynolds et al [119] at E V + 0. …”
Section: The Shallow E V +016 Ev Levelsupporting
confidence: 81%
“…The reports for N-induced DAP emissions continue [33, 34, 70-72, 98, 129, 131, 135, 148], with energies as low as 130 meV [119]. They attributed that acceptor level to a complex defect involving N and H, N O − V Zn − H + .…”
Section: Towards P-type Zno: the Doping Asymmetry And N-dopingmentioning
confidence: 96%
“…Recalling chapter 1, it can be remembered that for the case of metal organic chemical vapor deposition (MOCVD) grown ZnO:N, Reynolds et al [119] also recently observed the presence of an acceptor level with an activation energy of 150 meV, and have proposed that a V Zn −N O −H complex is responsible for its generation. Alternatively to ZnO, many groups have used MgZnO for the p-side of their p-n junctions, [40,149] among other reasons because MgZnO presents lower residual electron carrier concentrations than ZnO [37,45,75].…”
“…Since there is band bending close to the interface, the hole quasi-Fermi level may be close enough to the VB to allow the E V + 0.16 eV acceptors to contribute to hole generation. This trap matches quite well that observed by Reynolds et al [119] at E V + 0. …”
Section: The Shallow E V +016 Ev Levelsupporting
confidence: 81%
“…The reports for N-induced DAP emissions continue [33, 34, 70-72, 98, 129, 131, 135, 148], with energies as low as 130 meV [119]. They attributed that acceptor level to a complex defect involving N and H, N O − V Zn − H + .…”
Section: Towards P-type Zno: the Doping Asymmetry And N-dopingmentioning
confidence: 96%
“…Recalling chapter 1, it can be remembered that for the case of metal organic chemical vapor deposition (MOCVD) grown ZnO:N, Reynolds et al [119] also recently observed the presence of an acceptor level with an activation energy of 150 meV, and have proposed that a V Zn −N O −H complex is responsible for its generation. Alternatively to ZnO, many groups have used MgZnO for the p-side of their p-n junctions, [40,149] among other reasons because MgZnO presents lower residual electron carrier concentrations than ZnO [37,45,75].…”
“…Several theoretical studies [16][17][18] have pointed out that both nitrogen doping and metal vacancies may stabilize shallow acceptors levels above the valence band in ZnO, thus triggering the stabilization of a p-type conductivity. As reported in a recent work on the decomposition of ZnO 2 to prepare Zn-deficient ZnO, the nanostructuration of ZnO appears to be essential to control the metal vacancies in ZnO particles [11].…”
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