2015
DOI: 10.1016/j.susc.2014.12.002
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Separation of the attractive and repulsive contributions to the adsorbate–adsorbate interactions of polar adsorbates on Si(100)

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Cited by 9 publications
(3 citation statements)
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References 37 publications
(51 reference statements)
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“…This is a first step in the consideration of the substrate influence on the adsorption processes and the kinetics of adsorbate arrangement on the surface. Anyway, the dipole-dipole interaction is a main input to be used in the problems of surface dipole-lattice structures, which serve as models of adsorbate patterns on various substrates [34,43,[64][65][66][67][68][69][70][71][72].…”
Section: Introductionmentioning
confidence: 99%
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“…This is a first step in the consideration of the substrate influence on the adsorption processes and the kinetics of adsorbate arrangement on the surface. Anyway, the dipole-dipole interaction is a main input to be used in the problems of surface dipole-lattice structures, which serve as models of adsorbate patterns on various substrates [34,43,[64][65][66][67][68][69][70][71][72].…”
Section: Introductionmentioning
confidence: 99%
“…The pairwise interaction considered here can serve as an input in the calculations of possible electric-dipole lattice structures [34,43,66,68,71,72]. Therefore, the whole procedure of such calculations should take into account the substrate-induced distortion of lateral interactions.…”
mentioning
confidence: 99%
“…The SLMRG model exhibits excellent fitting between the experimental isotherm and theoretical data. This model provides a robust description of the experimental data and accounts for adsorbate-adsorbent interactions, significantly influencing adsorption competition and overall performance [40][41][42]. The SLMRG fitting parameters offer specific physical meanings, contributing to a deeper understanding of Cu 2+ adsorption isotherms that can be utilized to analyze the experimental data of Cu 2+ removal by OWP, OWPSA, and alginate.…”
Section: Adsorption Isotherm Modelsmentioning
confidence: 99%