CFET devices have become emerging and promising candidates for continuing Moore's law at sub-3 nm nodes owing to the area advantage of the N-P stacked structure, which markedly improves the integration of circuits. However, the introduction of vertical structure leads to severe thermal issues due to the self-heating effect, resulting in the degradation of the device and circuit performance. This paper mainly evaluates and analyzes the performance of the SRAM unit built using the CFET structure. The CFET-SRAM exhibits better performance than the conventional CMOS-SRAM in terms of access delay, even with the impact of self-heating. For the multi-fin-based CFET, although the total gate capacitance increases, the enhanced current improves the static noise margin significantly. However, as the number of channels expands, sheet-based CFET devices show more comprehensive superiority of area and performance.