Self‐Crosslinkable poly(arylene ether)s containing pendent phenylenetriazene groups

Abstract

Self‐crosslinkable poly(arylene ether)s 6, and 8, containing pendent triazene groups were prepared by nucleophilic substitution reaction of poly(arylene ether)s 5, and 7, respectively, with 1‐[4‐(4‐hydroxyphenoxy)phenylene]triazenes, 4, in the presence of potassium carbonate in N,N‐dimethylacetamide. A series of triazenes 4 containing various substituents have been synthesized. Self‐crosslinkable polymer 6e containing phenyl‐substituted triazene pendants can be crosslinked at 215°C, which is about 40°C lower than the glass transition temperature of the virgin base polymer 5. The degree of crosslinking can be tailored by varying the concentration of the pendent phenylenetriazene groups in the polymer. After curing, the flexible polymer films (ca. 10 μm thick) exhibit high gel contents, increased glass transition temperatures, improved resistance to organic solvents, and little change in dielectric constant and thermal stability. These self‐crosslinkable poly(arylene ether)s are potential candidates for electronic applications. © 1994 John Wiley & Sons, Inc.

Synthesis and properties of new photosensitive triazene polyacrylates

“…In the context of the notable progress made in understanding polymer ablation11 with direct consequences for the structuring of surfaces, the triazene polymers are considered materials of great promise for excimer laser ablation lithography12 as a complementary technique to conventional photolithography. Viewed from this perspective, some polymers with triazene functions (Ph N  N  N ), such as polyesters, polyethers, poly(methyl methacrylate)s (PMMAs), polysulfones, and polytriazenes, have been tested with UV/laser ablation 13–17. Comparisons of their microstructural characteristics with those of commercial polymers (i.e., polyimide and PMMA) have been made.…”