Self-Consistent Modeling of Volume and Surface Processes in Air Plasma

Gordiet︠s︡, B. F.; Ferreira, Carlos

doi:10.2514/2.566

Cited by 27 publications

(31 citation statements)

References 37 publications

(66 reference statements)

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“…Figure further reveals that the global behavior of the recombination probability with T w is the outcome of the interplay between the E‐R and L‐H recombination mechanisms. For T w below about 380 K Langmuir‐Hinshelwood recombination (R6) is dominant, in agreement with the conclusions from . Under the current assumptions, recombination between two physisorbed atoms (R7) becomes noticeable below 280 K and dominates at wall temperatures lower than 250 K. This can be explained by a fast increase of the coverage of physisorption sites as the wall temperature is decreased.…”

Section: Simulation Of Atomic Recombination On Surfacessupporting

confidence: 89%

Deterministic and Monte Carlo methods for simulation of plasma‐surface interactions

Marinov

Teixeira

Guerra

2016

Plasma Processes & Polymers

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Two approaches to the modeling of surface kinetics in reactive plasmas are discussed. Coarse‐grained deterministic models incorporate rate balance equations for coverages of surface active sites. They are computationally effective and can be readily coupled to reactor‐scale plasma simulations. In the kinetic Monte Carlo (KMC) approach, the time evolution of a gas‐lattice system consisting of a large number of particles is described. Although being more demanding computationally, KMC algorithms are exact, allow a straightforward description of distributions of surface reactivity and help bridging the gap between simulations on atomic and macroscopic scales. In this paper, theoretical and practical aspects of deterministic and KMC modeling of plasma‐surface interactions are discussed taking O recombination on silica as a model system.

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Section: Simulation Of Atomic Recombination On Surfacessupporting

confidence: 89%

Deterministic and Monte Carlo methods for simulation of plasma‐surface interactions

Marinov

Teixeira

Guerra

2016

Plasma Processes & Polymers

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“…At 300 K, the model of Guerra for O recombination on silica indicated that O recombination reported by Kim and Boudart, Gordiets and Ferreira, Greaves and Linnett, and Stewart et al is mainly via a L−H process. This suggests that the L−H component would also be the major pathway for O recombination on the silica-coated alumina surface near 300 K in the present study.…”

Section: Discussionmentioning

confidence: 99%

In-Situ Surface Recombination Measurements of Oxygen Atoms on Anodized Aluminum in an Oxygen Plasma

et al. 2008

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We observed the recombination of O atoms on a plasma-conditioned, anodized aluminum surface at room temperature. A cylindrical substrate was continuously exposed to the plasma and to a differentially pumped chamber where either Auger electron spectroscopy (AES) or mass spectrometry was used to detect surface and desorbing species. After long exposure to the oxygen inductively coupled plasma, the surface was heavily oxidized and contained 10% Si, a product of erosion of the fused silica discharge tube. Langmuir−Hinshelwood recombination coefficients for O on this surface were derived from the time-resolved desorption of O2, observed with delay times of 1−40 ms after plasma exposure. Recombination coefficients varied from γO = 0.06 ± 0.02 in the limit of low O flux (ΓO ≤ 1 × 1016 cm−2 s−1) to γO = 0.04 ± 0.01 0.02 at ΓO = 7.5 × 1016 cm−2 s−1. From the lack of any significant time-dependent change in O coverages measured by AES, it was concluded that a small fraction of the adsorbed O participated in surface recombination.

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“…These discharges are known to produce some active species of interest for applications, such as O( 3 P ) atoms, O 2 (a 1 g ) metastables, NO, NO 2 and N 2 O nitric oxides, and ozone O 3 . Kinetic studies of low-pressure N 2 -O 2 discharges at much higher O 2 percentages were conducted up to air conditions (20% O 2 ) in [50] and up to 100% O 2 in [33,51,52]. In these papers, the surface kinetics of N( 4 S) and O( 3 P ) atoms were also included in the models.…”

Section: Discharges and Post-discharges In N 2 -O 2 Plasmasmentioning

confidence: 99%

Non-equilibrium kinetics in N₂discharges and post-discharges: a full picture by modelling and impact on the applications

Loureiro¹,

Guerra²,

Sá

et al. 2011

Plasma Sources Sci. Technol.

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The main concerns associated with the establishment of a self-consistent model for N 2 discharges and post-discharges at low pressures (typically p ∼ 1 Torr), as well as in mixtures of this gas with O 2 and CH 4 are analysed and discussed. The focus is given on the coupling of the various kinetics involved: electrons, vibrational molecules N 2 (X 1 + g , v), dissociated atoms N( 4 S), ionic species, and various atomic and molecular electronic states. The impact of N 2 -O 2 and N 2 -CH 4 systems on the applications is briefly summarized by reviewing the essential kinetics. The difficulty in incorporating a self-consistent model for the surface kinetics is also discussed and a state-of-the-art approach for wall reactions is presented.

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Self-Consistent Modeling of Volume and Surface Processes in Air Plasma

Cited by 27 publications

References 37 publications

Deterministic and Monte Carlo methods for simulation of plasma‐surface interactions

Deterministic and Monte Carlo methods for simulation of plasma‐surface interactions

In-Situ Surface Recombination Measurements of Oxygen Atoms on Anodized Aluminum in an Oxygen Plasma

Non-equilibrium kinetics in N₂discharges and post-discharges: a full picture by modelling and impact on the applications

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Self-Consistent Modeling of Volume and Surface Processes in Air Plasma

Cited by 27 publications

References 37 publications

Deterministic and Monte Carlo methods for simulation of plasma‐surface interactions

Deterministic and Monte Carlo methods for simulation of plasma‐surface interactions

In-Situ Surface Recombination Measurements of Oxygen Atoms on Anodized Aluminum in an Oxygen Plasma

Non-equilibrium kinetics in N2discharges and post-discharges: a full picture by modelling and impact on the applications

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Non-equilibrium kinetics in N₂discharges and post-discharges: a full picture by modelling and impact on the applications