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2002
DOI: 10.1016/s0022-0248(02)00849-7
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Self-assembling quantum dot lattices through nucleation site engineering

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Cited by 38 publications
(26 citation statements)
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“…Therefore, spatial arrangement of several QDs with respect to a cavity mode is still an open issue and formation of quantum networks [136] seems quite challenging. To overcome these limitations direct control of the QD nucleation sites was carried out with patterned templates in the epitaxial growth [137][138][139] and first signatures of single QD weak coupling have been recently reported for micropillars [140]. For a recent review see [141].…”
mentioning
confidence: 99%
“…Therefore, spatial arrangement of several QDs with respect to a cavity mode is still an open issue and formation of quantum networks [136] seems quite challenging. To overcome these limitations direct control of the QD nucleation sites was carried out with patterned templates in the epitaxial growth [137][138][139] and first signatures of single QD weak coupling have been recently reported for micropillars [140]. For a recent review see [141].…”
mentioning
confidence: 99%
“…However, as advanced optoelectronic devices and new applications in nanoelectronics, like logic devices and memories, would clearly benefit from such ordered and precisely situated nanostructures, different approaches have been tried to artificially force QD to self-assemble at predefined sites on pre-patterned substrates [2][3][4][5][6][7][8][9][10]. In this situation, it is vital that the lithographic process used to pre-pattern the substrate will not introduce dislocations, impurities or other point defects at the QD nucleation site in order not to degrade the QD electronic and optical properties.…”
Section: Introductionmentioning
confidence: 99%
“…Such a lithography technology becomes more flexible and is capable of producing well-ordered, 2D periodic arrays of QDs from a wide variety of materials on many substrates. Many groups have used NSL to fabricate all kinds of nanostructures, including metal [17][18][19], semiconductor [20][21][22][23] and magnetic nanostructures [24]. In contrast to conventional lithography, NSL is inexpensive and highthroughput.…”
Section: Introductionmentioning
confidence: 99%