2005
DOI: 10.1016/j.spmi.2005.04.003
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Self-assembling of metal nanoparticles on patterned semiconductor surfaces (Au/GaAs)

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Cited by 10 publications
(10 citation statements)
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“…The classical approach for the fabrication of metallic structures with nanovoids is based upon a mechanical block of surface in the colloidal lithography method [7]. The most popular techniques to obtain island-like structures formed upon continuous film are based on thermal sputtering [1], various lithographic techniques [13][14][15], photo-stimulated chemical deposition [16]. There are also various approaches that involve chemical binding between nanoparticles and functionalized surfaces [17], in particular those that use microwave radiation [18].…”
Section: Introductionmentioning
confidence: 99%
“…The classical approach for the fabrication of metallic structures with nanovoids is based upon a mechanical block of surface in the colloidal lithography method [7]. The most popular techniques to obtain island-like structures formed upon continuous film are based on thermal sputtering [1], various lithographic techniques [13][14][15], photo-stimulated chemical deposition [16]. There are also various approaches that involve chemical binding between nanoparticles and functionalized surfaces [17], in particular those that use microwave radiation [18].…”
Section: Introductionmentioning
confidence: 99%
“…These peculiarities of microrelief are seen in the presented examples of section analysis (Figure 1 b,d), and their parameters can be determined by averaging Fourier transformations of AFM data for all cross-sections of AFM image. Three methods of metal nanoparticles deposition were used: 1) photoinduced chemical deposition of Au from aqueous salt AuCl 3 solution forming nanoparticles of various shape and size located predominantly at the tops of microrelief and, in particular, in the shape of nanowires on the ridges of quasigrating-type surface microrelief [ 4 ], 2) deposition of ca. 100 nm Ag NP from colloidal water suspension on poly(vinylpyridine) (PVP) modified the GaAs substrate (for immobilization of NP) with formation of separated NP and aggregates of NP on dielectric PVP interlayer [ 9 ], and 3) drop-coating deposition from aqua colloid solution of Au NP of 15 nm core size covered by silica shell with approximately 20-nm thickness [ 10 ].…”
Section: Methodsmentioning
confidence: 99%
“…Deposition of the noble metal (Au, Ag) nanoparticles on the semiconductor surface (interface) is known [ 1 ] as a perspective method for increasing the light absorption in semiconductor due to excitation of surface plasmons (SP) in nanoparticles (NP) or surface plasmon polaritons (SPP) in their periodical arrays and nanowires [ 2 ]. The spectral range of resonance modes excitation depends on the size and shape of particles, their local environment, and arrangement, which in turn are determined by the method of deposition, the substrate refractive index [ 3 ], and surface microrelief [ 4 ]. At the same time, texturing the front surface or interface of solar cell (SC) is considered as one of the effective methods to diminish optical losses and to enhance the transmittance of light into semiconductor and the solar cell efficiency [ 5 - 8 ].…”
Section: Introductionmentioning
confidence: 99%
“…The spectral range of resonance modes excitation depends on the size and shape of particles, their local environment, and arrangement, which in turn are determined by the method of deposition, the substrate refractive index [3], and surface microrelief [4]. At the same time, texturing the front surface or interface of solar cell (SC) is considered as one of the effective methods to diminish optical losses and to enhance the transmittance of light into semiconductor and the solar cell efficiency [5][6][7][8].…”
Section: Introductionmentioning
confidence: 99%