This study investigates the influence of surface nitridation
of
Ta metal foil substrates on the growth of GaN nanorods using the laser
molecular beam epitaxy (LMBE) technique and the field emission characteristics
of the grown GaN nanorod ensemble. Surface morphology examinations
underscore the pivotal role of Ta foil nitridation in shaping the
dimensions and densities of GaN nanorods. Bare Ta foil fosters the
formation of high-density, vertically self-aligned GaN nanorods at
a growth temperature of 700 °C. Furthermore, the density of these
nanorods is directly related to the duration of Ta foil nitridation,
with increased duration leading to a reduced nanorod density. X-ray
Photoelectron Spectroscopy (XPS) studies reveal that the transition
of the Ta foil surface from tantalum oxide to tantalum nitride during
nitridation emerges as a crucial factor influencing GaN nanorod growth.
Photoluminescence (PL) spectroscopy at ambient temperature reveals
a strong near-band-edge (NBE) emission peak with negligible defect-related
peaks, displaying the high optical quality of the GaN nanorods. The
highly dense vertically aligned GaN nanorod ensemble growth without
Ta prenitridation exhibits the most favorable field emission performance,
featuring a turn-on field of 2.1 V/μm, a field enhancement factor
of 2480, and a stable long-term operation at the emission current
density of 2.26 mA/cm2. This study advances the understanding
of the role of the surface chemistry of metal foil in determining
GaN nanorod growth and opens up exciting possibilities for tailoring
advanced optoelectronic devices for specific application requirements.