2000
DOI: 10.1021/la000277c
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Selective Self-Organization of Colloids on Patterned Polyelectrolyte Templates

Abstract: Submicron-sized colloidal particles have been self-organized into patterned arrangements on a substrate using a novel technique. At the substrate, a polyelectrolyte multilayer film has been deposited onto a chemically patterned surface; subsequently, the polyelectrolyte surface is immersed in an aqueous colloidal suspension of bare SiO2 microspheres or functionalized polystyrene latex particles. The colloids self-organize at the surface, driven by the spatially varied electrostatic and secondary interactions b… Show more

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Cited by 299 publications
(273 citation statements)
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“…Hammond et al used polyelectrolyte layers to produce patterned arrays of colloidal silica or polystyrene layers [61] while Jonas et al…”
Section: Electrostatic Depositionmentioning
confidence: 99%
See 1 more Smart Citation
“…Hammond et al used polyelectrolyte layers to produce patterned arrays of colloidal silica or polystyrene layers [61] while Jonas et al…”
Section: Electrostatic Depositionmentioning
confidence: 99%
“…All of the 26 Theory mentioned processes are able to produce defined patterns of monolayers as well by prestructuring of the substrate. [61][62][63] Figure 3.3.3. Electrostatic deposition process as demonstrated by Zhang et al [63] .…”
Section: Electrostatic Depositionmentioning
confidence: 99%
“…In the study by Aizenberg et al (25), the specific effect of capillary forces on the positioning of polystyrene particles (OCOOH or amidine functionalized) on charged thiol monolayer patterns was investigated. Hammond and coworkers (27) used polyelectrolyte multilayers on patterned thiol monolayers to adsorb silica and surface-modified polystyrene latex particles (OOSO 3 H, OCOOH, and OCONH 2 ) in dependence of pH, salt concentration, and the presence of surfactants. In our study we used glass, quartz, and silicon wafers with a native oxide layer as substrates for the particle-assembly experiments.…”
mentioning
confidence: 99%
“…This method has gained considerable attention for reasons of fundamental understanding and for advanced device fabrication. [41][42][43][44][45] Patterns on the substrate can be either chemical or topographical. Particle assembly is achieved by any of the three methods of particle deposition (horizontal, vertical or spin-casting), but the surface pattern directs the particles during the process.…”
Section: Surface Pattern-assisted Depositionmentioning
confidence: 99%
“…A scheme of colloidal assembly with chemical patterning is provided in Figure 4a, with an experimental example in Figure 4c [45]. Colloidal particles with a certain surface chemistry will selectively locate on the patterned regions.…”
Section: Surface Pattern-assisted Depositionmentioning
confidence: 99%