2013
DOI: 10.1021/nl4028999
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Selective Plasmon Enhancement of the 1.08 μm Nd3+ Laser Stark Transition by Tailoring Ag Nanoparticles Chains on a PPLN Y-cut

Abstract: Selective photoluminescence enhancement of the specific Nd(3+) Stark transition for which laser gain has been obtained in Nd(3+)/LiNbO3 is demonstrated by means of plasmonic resonances with the appropriate symmetry configuration. By using the nonpolar Y-cut of a periodically poled LiNbO3 crystal as platform for photoreduction of metallic nanostructures, periodically distributed chains of Ag nanoparticles oriented parallel to the ferroelectric c-axis are obtained. This alternative metallic nanostructure configu… Show more

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Cited by 17 publications
(22 citation statements)
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“…More detail on the size distribution and interparticle distances for that system can be found in reference . Here, it is worth noting the possibility of fabricating similar metallic arrangements on Nd 3+ :PPLN crystals using a nonpolar surface as a platform . In particular, the formation of metallic nanostructures on a Y‐cut Nd 3+ :PPLN substrate was demonstrated, showing that the metallic deposition was not necessarily linked to the persistence of spontaneous polarization, but to the presence of surface charge.…”
Section: Ferroelectric Lithographymentioning
confidence: 86%
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“…More detail on the size distribution and interparticle distances for that system can be found in reference . Here, it is worth noting the possibility of fabricating similar metallic arrangements on Nd 3+ :PPLN crystals using a nonpolar surface as a platform . In particular, the formation of metallic nanostructures on a Y‐cut Nd 3+ :PPLN substrate was demonstrated, showing that the metallic deposition was not necessarily linked to the persistence of spontaneous polarization, but to the presence of surface charge.…”
Section: Ferroelectric Lithographymentioning
confidence: 86%
“…d) PFM image of a periodically poled LiNbO 3 crystal (left panel) and the corresponding SEM image of Ag nanoparticle chains formed at the domain walls after the photodeposition process. Adapted with permission . Copyright 2013, American Chemical Society.…”
Section: Ferroelectric Lithographymentioning
confidence: 99%
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