“…Most of the selective reactions for SWNT separation [123,167] are classified into the following three types of chemical and physical processes; selective oxidation in the presence of H 2 O 2 [168,169,170,171,172], OsO 4 [173], H 2 SO 4 /HNO 3 [174,175,176,177], HNO 3 [178], ozone [179,180], AuCl 4 – [181], NaClO x [182] and air (high temperature) [183,184] for M/S, diameter and ( n , m ) selections, selective reaction with nitronium ion [185,186], NO 2 [187], carbene [188,189], diazonium salt [58,109,190,191,192,193,194,195,196,197,198,199,200,201,202], fluorine [203], triethylsilane [204], fluorinated olefin [205], SO 3 [206], RLi and RMgX [207], and azomethine ylide [208] for M/S separation, selective break-down of either metallic or semiconducting SWNTs by use of electricity [209,210,211], plasma [212,213], laser [214,215], microwave [174,216,217] and Xe-lamp [218], and electrochemica...…”