“…16–20 Moreover, aryl-radicals are relatively stable and thus able to diffuse for at least a few tens of nanometers before reacting, 21,22 often leading to resolution loss and decreasing the fabrication precision. The benefits of developing controlled aryl-radical addition is however high, motivating considerable efforts towards methodologies for their generation 23,24 and surface addition control. 22,25–29 Indeed, several precursors have emerged for triggering aryl radicals formation, such as aryl halides, aryltriflates, 8 aryl iodonium salts, 30 arylazosulfonates, 24 etc .…”