Selective metal electrodeposition through doping modulation of semiconductor surfaces

Abstract

We demonstrate selective electrodeposition of magnetic layers on doped semiconductors resulting in a self-aligned pattern which replicates the doping pattern in the semiconductor surface. A Schottky barrier forms at the interface between a semiconductor substrate and the electrolyte, which upon application of a cathodic potential is biased in the forward (reverse) direction for n- or p-type semiconductors, respectively. Electron transfer from an n-type semiconductor is thus possible, while breakdown of the Schottky barrier would be necessary for deposition on a p-type substrate. The process will thus be spatially selective on a lateral modulation of the substrate doping. As an example we demonstrate the deposition of Co on GaAs.

A short-range ordered–disordered transition of a NiOOH/Ni(OH)2 pair induces switchable wettability

“…The deposition principle is to control the native differences of the substrate activities, such as doping polarity, seed cultivation, or functionalized tailored groups. [42][43][44] We discovered that the extreme wetting contrast is capable of opening a voltage window for selective electroplating. As shown in Fig.…”

One‐Dimensional Nano‐Interconnection Formation

“…Current Status : Selective electrodeposition,57 including electrodeposition of selective metals from mixed solution58 and confined electrodeposition tuned by masks,59 refers to processes that enable electrochemical deposits consist of selective compositions or crystallize on expected sites 60. Numerous scholars, Allongue,61 Cachet,62 and Bindra,63 have engaged in the research on the electrodeposition of metal onto semiconductor, and applied it in realms of optical energy conversion and Schottky barrier device fabrication.…”

Nano electromechanical sensors based on carbon nanotubes

“…The current benchmark method for high-resolution patterning is electron beam (e-beam) lithography in combination with a lift-off process. Competing state-of-the art methods are the maskless focused ion beam (FIB) writing of Pt film nucleating preferentially nanofibers [64], or pulsed electrochemical deposition to form Ni and Fe catalyst islands of controlled size and density [65]. Nano contact printing can be employed to deposit purified Co colloids in regular patterns for low cost patterning over large areas [66].…”