1995
DOI: 10.1063/1.113671
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Selective growth of zinc-blende, wurtzite, or a mixed phase of gallium nitride by molecular beam epitaxy

Abstract: We report on the growth of GaN with a zinc-blende, wurtzite, or a mixed phase structure on (001)GaP and (001)GaAs substrates by a low-temperature modified molecular beam epitaxy technique. By systematically varying the incident arsenic overpressure, films grown at a moderate substrate temperature of ≊620 °C show predominately wurtzite α-GaN, zinc-blende β-GaN, or a mixed phase of the two. Films containing only the metastable phase β-GaN were achieved by using a relatively high growth temperature of ≊700 °C and… Show more

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Cited by 158 publications
(63 citation statements)
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“…Undoped cubic GaN films and cubic (Ga,Mn)N layers were grown on semi-insulating GaAs (001) substrates by plasma-assisted molecular beam epitaxy (PA-MBE) using arsenic as a surfactant to initiate the growth of cubic phase material [15]. Films where grown under Nrich conditions, which has been found to be necessary for the effective substitutional incorporation of Mn in hexagonal (Ga,Mn)N [16].…”
Section: Growth and Structurementioning
confidence: 99%
“…Undoped cubic GaN films and cubic (Ga,Mn)N layers were grown on semi-insulating GaAs (001) substrates by plasma-assisted molecular beam epitaxy (PA-MBE) using arsenic as a surfactant to initiate the growth of cubic phase material [15]. Films where grown under Nrich conditions, which has been found to be necessary for the effective substitutional incorporation of Mn in hexagonal (Ga,Mn)N [16].…”
Section: Growth and Structurementioning
confidence: 99%
“…Cubic (Ga,Mn)N layers, of typical thickness 300 nm, were grown on semi-insulating GaAs (001) substrates by plasma-assisted molecular beam epitaxy using arsenic as a surfactant to initiate the growth of cubic phase material [5]. Films were grown under N-rich conditions at growth temperatures from 450 to 680 o C. The Mn concentration in the films was set using the insitu beam monitoring ion gauge, and calibrated ex situ by secondary ion mass spectrometry (SIMS).…”
Section: Samples and Experimentalmentioning
confidence: 99%
“…The epitaxy of metastable, cubic GaN on GaAs (001) substrates has attracted some interest recently since c-GaN layers and the GaAs substrate have a common cleavage plane, they are considered to be well suited for the fabrication of laser cavities with cleaved facets [1][2][3][4][5][6][7][8]. [2].…”
Section: Introductionmentioning
confidence: 99%