Abstract:Selective growth of silver nanoparticles on ~100 nm thick silica patterns produced by nanoimprint method has been successfully demonstrated using either (1) thermo-induced reduction or (2) room temperature electroless deposition (ELD) without removing the ~25 nm thick residual layer left by nanoimprint process. This selectivity was achieved by silane additive, (3-mercaptopropyl)trimethoxysilane (3-MTS), which was added to the silica matrix to control nucleation and growth of silver. The presence of silver nano… Show more
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