Selective growth of InP on areas (1μm×1μm) of silicon (100) substrate by molecular beam epitaxy

Abstract

To use 111-V compound semiconductors as channel materials in the future advanced MISFETs with high performance, it is important to achieve the growth of III-V-on-Insulator structures on Si substrates. As a first step to accomplish this, we propose the selective formation of InP only on localized areas of Si (100) substrate by molecular beam epitaxy (MBE). It was found that InP was selectively grown only on bare Si window areas, while not grown on native silicon oxide areas at elevated substrate temperature (500°C). It was also found that by decreasing the window size (0.7xO.7 pm 2 ) only single grain of InP was grown on each bare Si window area. This indicates that the selective MBE growth of InP on Si substrate is possible.