2008
DOI: 10.1016/j.jcrysgro.2008.09.165
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Selective growth of GaN on sapphire substrates treated with focused femtosecond laser pulses

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Cited by 3 publications
(5 citation statements)
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“…Based on previous scanning electron microscope (SEM) and atomic force microscope (AFM) measurements, we confirm that GaN growth has been suppressed over the laser-irradiated area. 11) In contrast, with increasing laser-pulse energy up to 0.95 J (the top feature), the center of the laser-irradiated area was covered with a GaN layer again. Since this GaN domain frequently coalesced to the adjacent Ga-face (þc) layer, the growth is epitaxial with respect to the underlying substrate, suggesting re-exposure of the substrate surface after laserirradiation.…”
mentioning
confidence: 98%
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“…Based on previous scanning electron microscope (SEM) and atomic force microscope (AFM) measurements, we confirm that GaN growth has been suppressed over the laser-irradiated area. 11) In contrast, with increasing laser-pulse energy up to 0.95 J (the top feature), the center of the laser-irradiated area was covered with a GaN layer again. Since this GaN domain frequently coalesced to the adjacent Ga-face (þc) layer, the growth is epitaxial with respect to the underlying substrate, suggesting re-exposure of the substrate surface after laserirradiation.…”
mentioning
confidence: 98%
“…Specifically, for patterning process, we employed carbon mask layers to avoid the etching process. 11,12) We have found that this carbon mask layer can be formed onto a sapphire substrate via modification of an organic polymer layer with focused laser irradiation, 11) as well as electron beam exposure. 12) After performing selective growth, this carbon mask layer was removed by thermal treatments, and the re-exposed sapphire surface was nitrided, so that the polarity of GaN was locally inverted during MOCVD growth.…”
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confidence: 99%
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