Selective growth of Co islands on ion beam induced nucleation centers in a native SiO2 film

Čechal, Jan; Tomanec, Ondřej; Škoda, David; Koňáková, Kateřina; Hrnčíř, Tomáš; Mach, Jindřich; Kolı́bal, Miroslav; Šikola, Tomáš

doi:10.1063/1.3116188

Cited by 13 publications

(9 citation statements)

References 37 publications

(36 reference statements)

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“…We observe triangular particles on silicon <111> wafers as opposed to square precipitates on silicon <100> wafers. The different shapes formed on the <111> and <100> silicon surfaces are consistent with previous studies in which the metals on the surface of silicon self‐assembled into shapes along the <110> direction 35–37…”

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confidence: 90%

Seeding of Silicon Wire Growth by Out‐Diffused Metal Precipitates

Ganapati

Fenning

Bertoni

et al. 2011

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We propose the out-diffused metal precipitates (OMP) method to seed metal catalysts for bottom-up silicon wire growth. We fi rst in-diffuse the silicon substrate with a fastdiffusing metal (e.g., copper), and then anneal with a temperature profi le tuned to out-diffuse the metal to favorable nucleation sites on the surface. Vapor-liquid-solid (VLS) silicon wire growth on seeds from the OMP method is demonstrated. The OMP method has the potential to seed wires of any size at any position on a three-dimensional surface, in a high-throughput manner.Silicon nanowires and microwires have potential for applications in integrated circuits, [ 1 ] solar cells, [2][3][4][5] lithium batteries, [ 6 ] and biological sensors. [ 7 ] For example, Kelzenberg et al. [ 4 ] have demonstrated enhanced light absorption and decreased materials usage in solar cells fabricated from silicon microwire arrays, with distinct performance advantages over nanowire-based solar cells. A common bottom-up approach to synthesizing silicon wires is the VLS method, in which liquid metal droplets are used to catalyze crystalline wire growth. In the VLS method, fi rst proposed by Wagner, [ 8 ] a metal catalyst is seeded onto the surface of a silicon substrate, and nanowires are grown by chemical vapor deposition (CVD) with a gas such as silane or silicon tetrachloride. The metal catalyst generally used is gold; [ 9 ] however other metals such as copper [10][11][12][13][14][15] have been utilized successfully.Many techniques have been demonstrated for seeding metal catalysts on silicon substrates. A standard method is to deposit a thin metal layer, typically nanometers thick, and heat the substrate until the fi lm dewets into droplets. However, on a smooth surface the positions of these droplets are random, and fi lm thickness gives only limited control over wire diameters. [ 16 ] To gain control over position of the droplets, an ordered array of pits on the substrate can be created with a combination of photolithography and potassium hydroxide etching (e.g., on a < 100 > silicon substrate). The periodic curvature of the metal fi lm guides the dewetting of the layer. [ 16 ] Photolithography can also be used with a lift-off procedure to pattern the metal catalyst. This has been demonstrated by Choi et al. [ 17 ] with gold droplets patterned into potassium hydroxide etched pits, and by Kayes et al. [ 18 ] with gold and copper islands separated by an oxide. For smaller feature sizes, nanoimprint or nanosphere lithography techniques are used. In nanoimprint lithography, e-beam lithography is used to create a stamp to pattern resist, and is followed by a lift-off procedure. [ 19 ] Nanosphere lithography, in which a metal (e.g., gold) is patterned by a layer of polystyrene nanospheres, has been shown to successfully create ordered arrays of nanowires in a hexagonal pattern with a gold catalyst. [ 20,21 ] Other techniques for metal catalyst seeding include electrodeposition of gold into an anodized alumina [ 9 , 22 ] or other oxide template, [ 23 ] using block...

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confidence: 90%

Seeding of Silicon Wire Growth by Out‐Diffused Metal Precipitates

Ganapati

Fenning

Bertoni

et al. 2011

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“…These developments are not only vital for technology advancements but also enable studies of physical and biological processes in unprecedented detail for new scientific opportunities [6]. Surface nanocraters or nanoscale concave features are often created as artificial surface nucleation sites for such developments compared with the employment of convex and planar nucleation sites [2][3][4][5]. Given the technological importance of the nucleation phenomena on concave nucleation sites, it is necessary to have a good understanding of the factors that affect such nucleation processes.…”

Section: Introductionmentioning

confidence: 99%

“…For instance, nucleation sites with specified size, shape, alignment and periodicity can be created by nanopatterning on selected substrate surfaces to enable directed nucleation or surface activity for applications in areas of microelectronics, magnetic data storage, biological control, micro-contact printing, gas separation, etc [1][2][3][4][5][6][7]. These developments are not only vital for technology advancements but also enable studies of physical and biological processes in unprecedented detail for new scientific opportunities [6].…”

Section: Introductionmentioning

confidence: 99%

“…Recent advances in materials processing have permitted the fabrication of patterned surface nanostructures by a variety of means [1][2][3][4][5][6][7]. For instance, nucleation sites with specified size, shape, alignment and periodicity can be created by nanopatterning on selected substrate surfaces to enable directed nucleation or surface activity for applications in areas of microelectronics, magnetic data storage, biological control, micro-contact printing, gas separation, etc [1][2][3][4][5][6][7].…”

Section: Introductionmentioning

confidence: 99%

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The characteristics of heterogeneous nucleation on concave surfaces and implications for directed nucleation or surface activity by surface nanopatterning

Qian

2012

Journal of Crystal Growth

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“…The dimpled or patterned surface of the substrate is effective for the growth of nano-structures [39,40]. The primary mechanism in the growth of surface nano-structures from adsorbed species is the transport of these species on a flat and dimpled surface of the substrate.…”

Section: Growth Mechanism Of Flower-like Patternsmentioning

confidence: 99%