Selective dewetting of metal films for fabrication of atomically separated nanoplasmonic dimers

Suri, Priyanka; Deshpande, P K; Ghosh, Ambarish

doi:10.1109/icee44586.2018.8937871

Cited by 2 publications

(2 citation statements)

References 4 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The porosity variations so caused across the samples result in different degree with which the Ag vapor goes lower within the helices. The sheer intrinsic nature of the annealing process also causes randomness of size of islands [75,78], further adding to the morphological variations and to the angle dependence of CD. Despite the variabilities occurring due to the inherent nature of the fabrication process, the averaged chiro-optical response of the material noted from the experiments remained almost uniform across the wafer.…”

Section: Resultsmentioning

confidence: 99%

Chiro-optical response of a wafer scale metamaterial with ellipsoidal metal nanoparticles

et al. 2021

View full text Add to dashboard Cite

We report a large chiro-optical response from a nanostructured film of aperiodic dielectric helices decorated with ellipsoidal metal nanoparticles. The influence of the inherent fabrication variation on the chiro-optical response of the wafer-scalable nanostructured film is investigated using a computational model which closely mimics the material system. From the computational approach, we found that the chiro-optical signal is strongly dependent on the ellipticities of the metal nanoparticles and the developed computational model can account for all the variations caused by the fabrication process. We report the experimentally realized dissymmetry factor ∼1.6, which is the largest reported for wafer scalable chiro-plasmonic samples till now. The calculations incorporate strong multipolar contributions of the plasmonic interactions to the chiro-optical response from the tightly confined ellipsoidal nanoparticles, improving upon the previous studies carried in the coupled dipole approximation regime. Our analyzes confirm the large chiro-optical response in these films developed by a scalable and simple fabrication technique, indicating their applicability pertaining to manipulation of optical polarization, enantiomer selective identification and enhanced sensing and detection of chiral molecules.

show abstract

Section: Resultsmentioning

confidence: 99%

Chiro-optical response of a wafer scale metamaterial with ellipsoidal metal nanoparticles

et al. 2021

View full text Add to dashboard Cite

show abstract

“…Fe [15], Ni [16,17], Cu [18], Pd, Ag [19][20][21], Pt [20,22], or Au [23][24][25]) has been exploited to create nanoscale patterns on various substrates relevant to nanoelectronics, including SiO 2 [18][19][20][22][23][24][25], Si 3 N 4 [16], Al 2 O 3 [26], GaN [16], and InGaN [17]. Dewetting of Ag on MoS 2 also allows for the creation of adjacent pairs of islands for surface enhanced Raman scattering (SERS) [27].…”

Section: Introductionmentioning

confidence: 99%

Electron beam evaporated Au islands as a nanoscale etch mask on few-layer MoS₂ and fabrication of top-edge hybrid contacts for field-effect transistors

Walter¹,

Oliver²,

Mohney³

2020

Nanotechnology

View full text Add to dashboard Cite

Metal contacts to two-dimensional layered semiconductors are crucial to the performance of field-effect transistors (FETs) and other applications of layered materials in nanoelectronics and beyond. In this work, the wetting behavior of very thin Au films on exfoliated MoS2 flakes was studied and evaluated as a nanoscale, self-assembled dry etch mask. Etching nanoscale pits into MoS2 flakes prior to metallization from the top of the flake forms edge sites that contribute some fraction of edge contacts in addition to top contacts for additional carrier injection and lower contact resistance. The morphology and thickness of Au islands and MoS2 were studied with scanning electron microscopy and atomic force microscopy before and after etching with low-power plasmas. A Cl2 plasma etch of 10 s with a Au island mask of 6 nm (nominal) showed the best resulting morphology among the plasma conditions studied. Back-gated MoS2-based FETs on SiO2/p +-Si with Ti/Au contacts were fabricated using a Cl2 etch of only the contact regions, and they yielded devices with ON currents of 100s µA/µm, ON/OFF ratios ⩾106, and contact resistance <10 kΩ µm. The best set of devices had a very low contact resistance of ∼1 kΩ µm with almost no dependence of contact resistance on gating. Using nanoscale etch masks made from metal islands could be highly customizable and shows promise for engineering FETs with low contact resistance.

show abstract

Selective dewetting of metal films for fabrication of atomically separated nanoplasmonic dimers

Cited by 2 publications

References 4 publications

Chiro-optical response of a wafer scale metamaterial with ellipsoidal metal nanoparticles

Chiro-optical response of a wafer scale metamaterial with ellipsoidal metal nanoparticles

Electron beam evaporated Au islands as a nanoscale etch mask on few-layer MoS₂ and fabrication of top-edge hybrid contacts for field-effect transistors

Contact Info

Product

Resources

About

Selective dewetting of metal films for fabrication of atomically separated nanoplasmonic dimers

Cited by 2 publications

References 4 publications

Chiro-optical response of a wafer scale metamaterial with ellipsoidal metal nanoparticles

Chiro-optical response of a wafer scale metamaterial with ellipsoidal metal nanoparticles

Electron beam evaporated Au islands as a nanoscale etch mask on few-layer MoS2 and fabrication of top-edge hybrid contacts for field-effect transistors

Contact Info

Product

Resources

About

Electron beam evaporated Au islands as a nanoscale etch mask on few-layer MoS₂ and fabrication of top-edge hybrid contacts for field-effect transistors