1998
DOI: 10.1016/s0955-2219(98)00247-7
|View full text |Cite
|
Sign up to set email alerts
|

Selection of Materials for Use at Temperatures above 1500°C in Oxidizing Atmospheres

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
10
0

Year Published

2006
2006
2021
2021

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 30 publications
(14 citation statements)
references
References 1 publication
0
10
0
Order By: Relevance
“…Significant research in the growth and characterization of both Gd 2 O 3 and Y 2 O 3 has been undertaken over the past few years because of their several relevant physical properties and technical applications such as: high melting point [1]; high mechanical strength [2]; high dielectric constant (in the range [14][15][16][17][18] [3]; a rather high refractive index n ≅ 2 [4]; and a very good protective behavior as a coating in reactive severe environment [5]. Both are promising materials for electronic applications to replace SiO 2 in metal-oxide-semiconductor (MOS) heterostructures used in the MOS transistor [6].…”
Section: Introductionmentioning
confidence: 99%
“…Significant research in the growth and characterization of both Gd 2 O 3 and Y 2 O 3 has been undertaken over the past few years because of their several relevant physical properties and technical applications such as: high melting point [1]; high mechanical strength [2]; high dielectric constant (in the range [14][15][16][17][18] [3]; a rather high refractive index n ≅ 2 [4]; and a very good protective behavior as a coating in reactive severe environment [5]. Both are promising materials for electronic applications to replace SiO 2 in metal-oxide-semiconductor (MOS) heterostructures used in the MOS transistor [6].…”
Section: Introductionmentioning
confidence: 99%
“…As can be seen from these results, the samples were all well sintered with a relatively low porosity of less than 6.5%. Previous studies have demonstrated that the densification of Si 3 N 4 –MoSi 2 composites is still a challenge without sintering additives [20,21,22,23]. It was found that with the addition of Y and La, the densification could be significantly improved [24,25].…”
Section: Resultsmentioning
confidence: 99%
“…The observed oxidation behaviour is in accordance to the results of Lee at al. 29),31) and Bundschuh et al 32) The composites obtained of both routes show at 1300°C precipitations that cause cracks in the oxide layer, see Fig. 5.…”
Section: Ageing At Elevated Temperatures and Electrical Resistivitymentioning
confidence: 89%