2020
DOI: 10.1021/acs.langmuir.0c00374
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Seeded Growth of Large-Area Arrays of Substrate Supported Au Nanoparticles Using Citrate and Hydrogen Peroxide

Abstract: While seeded growth of quasi-spherical colloidal Au nanoparticles (NPs) has been extensively explored in the literature, the growth of surface supported arrays of such particles has received less attention. The latter scenario offers some significant challenges, including the attainment of sufficient particle-substrate adhesion, growth-selectivity, and uniform mass-transport. To this end, a reaction system consisting of HAuCl 4 , citrate, and H 2 O 2 … Show more

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Cited by 5 publications
(16 citation statements)
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“…One ALD cycle of HfO 2 (Picosun R-200, 170 ° C, 1 cycle: 5 s H 2 O, 10 s N 2 , 0.1 s tetrakis­(dimethylamido)­hafnium­(IV), 10 s N 2 . Termination: 0.1 s H 2 O, 10 s N 2 , 5 s H 2 O) was performed on all wafers, to augment the particle–substrate adhesion, prior to applying (spin-coating, 500 rpm) and soft-baking (hotplate, 110 ° C, 10 min) a thick layer of S1813 photoresist. The purpose of the S1813 is to serve as a protective coating during the subsequent dicing (Disco DAD 361) of the wafers into 20 × 20 mm 2 sample pieces.…”
Section: Experimental Sectionmentioning
confidence: 99%
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“…One ALD cycle of HfO 2 (Picosun R-200, 170 ° C, 1 cycle: 5 s H 2 O, 10 s N 2 , 0.1 s tetrakis­(dimethylamido)­hafnium­(IV), 10 s N 2 . Termination: 0.1 s H 2 O, 10 s N 2 , 5 s H 2 O) was performed on all wafers, to augment the particle–substrate adhesion, prior to applying (spin-coating, 500 rpm) and soft-baking (hotplate, 110 ° C, 10 min) a thick layer of S1813 photoresist. The purpose of the S1813 is to serve as a protective coating during the subsequent dicing (Disco DAD 361) of the wafers into 20 × 20 mm 2 sample pieces.…”
Section: Experimental Sectionmentioning
confidence: 99%
“…As previously demonstrated, the use of atomic layer deposition (ALD) post-seed formation can be used to satisfactorily address (i). Performing as little as a single ALD cycle of HfO 2 was proven to be highly effective in preventing particle desorption without hampering subsequent metal deposition …”
Section: Introductionmentioning
confidence: 99%
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