2019
DOI: 10.1109/tns.2019.2908067
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SEE Flux and Spectral Hardness Calibration of Neutron Spallation and Mixed-Field Facilities

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Cited by 15 publications
(26 citation statements)
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“…The respective references are AS7C34098A-10TCN (200 nm) for Alliance and K6R4016V1D-TC10 (180 nm) for Samsung, both with 4 Mbit of memory. They were tested against SEL in Reference [2] and [15]. In the ChipIr spallation facility, the SEL cross section resulted in 7.1×10 -11 cm 2 /dev and 6.8×10 -11 cm 2 /dev for Alliance and Samsung, respectively [2].…”
Section: See Calculation and Resultsmentioning
confidence: 99%
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“…The respective references are AS7C34098A-10TCN (200 nm) for Alliance and K6R4016V1D-TC10 (180 nm) for Samsung, both with 4 Mbit of memory. They were tested against SEL in Reference [2] and [15]. In the ChipIr spallation facility, the SEL cross section resulted in 7.1×10 -11 cm 2 /dev and 6.8×10 -11 cm 2 /dev for Alliance and Samsung, respectively [2].…”
Section: See Calculation and Resultsmentioning
confidence: 99%
“…The H10% values spread up to almost 1800 MeV (Table 1), which are also typical in accelerator environments. For comparison, the ChipIr spallation facility provides the hardness of 283 MeV [2].…”
Section: Atmospheric Radiation Environmentsmentioning
confidence: 99%
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