Second‐harmonic spectroscopy of Si nanocrystals embedded in silica

Wirth, Adrian; Wei, Jing; Gielis, Jjh Joost; Figliozzi, P.; Rafaelsen, Jens; An, Yongli; Downer, M. C.

doi:10.1002/pssc.200779125

Cited by 5 publications

(2 citation statements)

References 12 publications

(17 reference statements)

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“…The special case of this so-called cross-polarized two-beam second-harmonic generation has been used to study Si nanocrystals embedded in fused silica. 45,46,48,49 Returning to the amorphous film/Si͑100͒ substrate geometry, the polarization dependence of all surface dipole and bulk electric quadrupole/magnetic dipole terms contributing for this system are summarized in Table I. In brief, for amorphous thin films on Si͑100͒, isotropic surface dipole components originating from surfaces and interfaces can contribute to the SHG response.…”

Section: +¯ ͑6͒mentioning

confidence: 99%

Optical second-harmonic generation in thin film systems

Gielis

Gevers

Aarts

et al. 2008

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Document VersionPublisher's PDF, also known as Version of Record (includes final page, issue and volume numbers) Please check the document version of this publication:• A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and page numbers. Link to publication General rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.• Users may download and print one copy of any publication from the public portal for the purpose of private study or research.• You may not further distribute the material or use it for any profit-making activity or commercial gain • You may freely distribute the URL identifying the publication in the public portal ? Take down policyIf you believe that this document breaches copyright please contact us providing details, and we will remove access to the work immediately and investigate your claim. The surface and interface sensitive nonlinear optical technique of second-harmonic generation ͑SHG͒ is a very useful diagnostic in studying surface and interface properties in thin film systems and can provide relevant information during thin film processing. An important aspect when applying SHG is the interpretation of the SHG response. In order to utilize the full potential of SHG during materials processing it is necessary to have a good understanding of both the macroscopic and the microscopic origin of the SHG response, particularly in thin film or multilayer systems where the propagation of radiation is another important aspect that should be considered carefully. A brief theoretical overview on the origin of the SHG response and a description of the propagation of radiation will be given. Furthermore, several methods will be discussed that might reveal the possible macroscopic and microscopic origins of the SHG response in thin film systems. The different approaches will be illustrated by examples of real-time and spectroscopic SHG experiments with thin film systems relevant in Si etching and deposition environments, such as ͑1͒ hydrogenated amorphous Si films deposited by hot-wire chemical vapor deposition on both Si͑100͒ and fused silica substrates, ͑2͒ amorphous Si generated by low-energy Ar + -ion bombardment of H terminated Si͑100͒, and ͑3͒ Al 2 O 3 films deposited by plasma-assisted atomic layer deposition on H terminated Si͑100͒.

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Section: +¯ ͑6͒mentioning

confidence: 99%

Optical second-harmonic generation in thin film systems

Gielis

Gevers

Aarts

et al. 2008

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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“…It was also used to estimate the speed of hydrogen adsorption [8] and the diffusion constant of hydrogen [18] on a Si(111) surface. In addition, it has been applied to probe charge trapping kinetics in thin films on Si surfaces [19] and the electronic states of Si nanocrystals [20]. Recently, the absolute phase and amplitude of a surface dipole at Si(001) interfaces was determined [21].…”

Section: Sfg and Shg Microscopymentioning

confidence: 99%

Second-Order Nonlinear Optical Microscopy of a H–Si(111)1 × 1 Surface in Ultra-High Vacuum Conditions

Miyauchi

2012

Physics Research International

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This paper reviews the use of optical sum frequency generation (SFG) and second harmonic generation (SHG) microscopy under ultra-high vacuum (UHV) conditions to observe the dynamics of a hydrogen terminated Si(111)1 × 1 surface. First, we took SFG and SHG microscopic images of the surface after IR light pulse irradiation and found that the SHG and nonresonant SFG signals were enhanced, probably due to the formation of dangling bonds after hydrogen desorption. Second, we observed time-resolved SFG intensity images of a H-Si(111)1 × 1 surface. After visible pump light irradiation, the nonresonant SFG signal increased at probe delay time 0 ps and then decreased over a life time of 565 ps. The resonant SFG signal reduced dramatically at 0 ps and then recovered with an anisotropic line shape over a life time of 305 ps. The areas of modulated SFG signals at delay time 277 ps were expanded with an anisotropic aspect. Finally, we observed SFG intensity images of hydrogen deficiency on a Si(111)1 × 1 surface as a function of temperature. These images of the H-Si(111) surface, taken with a spatial resolution of 5 μm at several temperatures from 572 to 744 K, showed that the hydrogen desorbs homogeneously.

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Hot-wire chemical vapor deposition of silicon nanoparticles on fused silica

Salivati

Downer

et al. 2009

Thin Solid Films

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Second‐harmonic spectroscopy of Si nanocrystals embedded in silica

Cited by 5 publications

References 12 publications

Optical second-harmonic generation in thin film systems

Optical second-harmonic generation in thin film systems

Second-Order Nonlinear Optical Microscopy of a H–Si(111)1 × 1 Surface in Ultra-High Vacuum Conditions

Hot-wire chemical vapor deposition of silicon nanoparticles on fused silica

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