Seamless Pattern Fabrication of Large-Area Nanostructures Using Ultraviolet Nanoimprint Lithography

Abstract

The seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography (UV-NIL) was studied. Large-area nanopatterning is required in the actual mass production of optical devices and biological microchips. We applied the double lithography method of litho-etch-litho-etch for UV-NIL process. The proposed multiple UV-NIL process realized 66 Â 45 mm 2 pattern area, which has 50 nm width and 150 nm space line patterns on a quartz wafer.

Ultraviolet-nanoimprinted packaged metasurface thermal emitters for infrared CO2sensing

“…However, there are few reports of NIL on patterned substrates [23]. In the early stage of our study, the residual resist layer on the heater pattern was not uniform; the residual layer was thick at the center of the heater and thin at the edges.…”

Quasi-seamless stitching for large-area micropatterned surfaces enabled by Fourier spectral analysis of moiré patterns

“…Accordingly, roll-to-roll [15][16][17] or roll-to-plate [18][19][20] nanoimprint lithography (R2R-NIL or R2P-NIL, respectively), a mechanical patterning method, is an irreplaceable manufacturing tool because it is capable of the continuous and cost-effective production of multiscale structures over square-meter-large and exible substrates 11,12,[21][22][23][24][25] . However, the challenges of preparing large-area imprint molds signi cantly limit the critical advantage of roll-based NIL for the large-area production of functional surfaces 23,[25][26][27] . Because the original master molds are typically fabricated using e-beam lithography, photolithography, or interference lithography, the small mold should be repeatedly stitched to create a exible large replicate mold to su ciently cover the circumference of the roll, resulting in unavoidable seam regions.…”

“…Because the original master molds are typically fabricated using e-beam lithography, photolithography, or interference lithography, the small mold should be repeatedly stitched to create a exible large replicate mold to su ciently cover the circumference of the roll, resulting in unavoidable seam regions. Accordingly, extensive efforts have been made to fabricate scalable and exible imprint molds 23,[25][26][27] . Owing to these di culties in fabricating multiscale patterns directly over a large area, a step-and-repeat process using mechanical alignment system 27,28 and shadow mask has been developed…”

“…Accordingly, extensive efforts have been made to fabricate scalable and exible imprint molds 23,[25][26][27] . Owing to these di culties in fabricating multiscale patterns directly over a large area, a step-and-repeat process using mechanical alignment system 27,28 and shadow mask has been developed…”

“…to fabricate large-area master molds 24,25,27,29 . Although multiple-stitched exible molds have been widely used in roll-based NIL, there is a critical limit to satisfying the requirements of practical applications because of the clear formation of alignment marks and stitching seams, which are easily detectable by the naked eye 23,30 .…”